Optimization of the focus monitor mark in immersion lithography according to illumination type

	Optimization of the focus monitor mark in immersion lithography according to illumination type
	Zhang LB(张利斌); Wei YY(韦亚一); He JF(何建芳); Su XJ(苏晓菁); Dong LS(董立松)
刊名	J. Micro/Nanolith. MEMS MOEMS
	2017-08-24
文献子类	期刊论文
语种	英语
内容类型	期刊论文
源URL	[http://159.226.55.106/handle/172511/18089]
专题	微电子研究所_集成电路先导工艺研发中心
作者单位	中国科学院微电子研究所
推荐引用方式 GB/T 7714	Zhang LB,Wei YY,He JF,et al. Optimization of the focus monitor mark in immersion lithography according to illumination type[J]. J. Micro/Nanolith. MEMS MOEMS,2017.
APA	Zhang LB,Wei YY,He JF,Su XJ,&Dong LS.(2017).Optimization of the focus monitor mark in immersion lithography according to illumination type.J. Micro/Nanolith. MEMS MOEMS.
MLA	Zhang LB,et al."Optimization of the focus monitor mark in immersion lithography according to illumination type".J. Micro/Nanolith. MEMS MOEMS (2017).