A method to restrain the charging effect on insulating substrate in high energy electron beam lithography

	A method to restrain the charging effect on insulating substrate in high energy electron beam lithography
	Jing YP(景玉鹏); Chen BQ(陈宝钦); Yu MY(于明岩); Zhao SR(赵士瑞); Shi YB(施云波)
刊名	半导体学报
	2014-12-01
公开日期	2015-04-22
内容类型	期刊论文
源URL	[http://10.10.10.126/handle/311049/12680]
专题	微电子研究所_微电子仪器设备研发中心
通讯作者	Yu MY(于明岩)
推荐引用方式 GB/T 7714	Jing YP,Chen BQ,Yu MY,et al. A method to restrain the charging effect on insulating substrate in high energy electron beam lithography[J]. 半导体学报,2014.
APA	景玉鹏,陈宝钦,于明岩,赵士瑞,&施云波.(2014).A method to restrain the charging effect on insulating substrate in high energy electron beam lithography.半导体学报.
MLA	景玉鹏,et al."A method to restrain the charging effect on insulating substrate in high energy electron beam lithography".半导体学报 (2014).