Recrystallization Phase in He-Implanted 6H-SiC | |
Lin, Hua3; Zhang, Li1; Liu, Yu-Zhu3; Li, Bing-Sheng2 | |
刊名 | CHINESE PHYSICS LETTERS |
2017-06-01 | |
卷号 | 34页码:4 |
ISSN号 | 0256-307X |
DOI | 10.1088/0256-307X/34/7/076101 |
英文摘要 | The evolution of the recrystallization phase in amorphous 6H-SiC formed by He implantation followed by thermal annealing is investigated. Microstructures of recrystallized layers in 15 keV He+ ion implanted 6H-SiC (0001) wafers are characterized by means of cross-sectional transmission electron microscopy (XTEM) and high-resolution TEM. Epitaxial recrystallization of buried amorphous layers is observed at an annealing temperature of 900 degrees C. The recrystallization region contains a 3C-SiC structure and a 6H-SiC structure with different crystalline orientations. A high density of lattice defects is observed at the interface of different phases and in the periphery of He bubbles. With increasing annealing to 1000 degrees C, 3C-SiC and columnar epitaxial growth 6H-SiC become unstable, instead of [0001] orientated 6H-SiC. In addition, the density of lattice defects increases slightly with increasing annealing. The possible mechanisms for explanation are also discussed. |
资助项目 | National Natural Science Foundation of China[11475229] ; College Students Practice Innovative Training Program of Nanjing University of Information Science Technology[201610300042] |
WOS关键词 | AMORPHOUS-SILICON CARBIDE ; ION ; IRRADIATION |
WOS研究方向 | Physics |
语种 | 英语 |
出版者 | IOP PUBLISHING LTD |
WOS记录号 | WOS:000410696400037 |
资助机构 | National Natural Science Foundation of China ; College Students Practice Innovative Training Program of Nanjing University of Information Science Technology |
内容类型 | 期刊论文 |
源URL | [http://119.78.100.186/handle/113462/45628] |
专题 | 近代物理研究所_先进核能材料研究室(ADS) |
通讯作者 | Li, Bing-Sheng |
作者单位 | 1.Lanzhou Univ Technol, Sch Sci, Dept Phys, Lanzhou 730050, Gansu, Peoples R China 2.Chinese Acad Sci, Inst Modern Phys, Lanzhou 730000, Gansu, Peoples R China 3.Nanjing Univ Informat Sci & Technol, Jiangsu Collaborat Innovat Ctr Atmospher Environm, Nanjing 210044, Jiangsu, Peoples R China |
推荐引用方式 GB/T 7714 | Lin, Hua,Zhang, Li,Liu, Yu-Zhu,et al. Recrystallization Phase in He-Implanted 6H-SiC[J]. CHINESE PHYSICS LETTERS,2017,34:4. |
APA | Lin, Hua,Zhang, Li,Liu, Yu-Zhu,&Li, Bing-Sheng.(2017).Recrystallization Phase in He-Implanted 6H-SiC.CHINESE PHYSICS LETTERS,34,4. |
MLA | Lin, Hua,et al."Recrystallization Phase in He-Implanted 6H-SiC".CHINESE PHYSICS LETTERS 34(2017):4. |
个性服务 |
查看访问统计 |
相关权益政策 |
暂无数据 |
收藏/分享 |
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。
修改评论