Role of rough substrate on the growth of large single-crystal MoS2 by chemical vapor deposition | |
Cheng, Zhaofang; Xia, Minggang; Liu, Shiru; Hu, Ruixue; Liang, Gongying; Zhang, Shengli | |
刊名 | APPLIED SURFACE SCIENCE |
2019 | |
卷号 | 476页码:1008-1015 |
关键词 | Chemical vapor deposition Large single-crystal MoS2 Rough substrate |
ISSN号 | 0169-4332 |
URL标识 | 查看原文 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/2828683 |
专题 | 西安交通大学 |
推荐引用方式 GB/T 7714 | Cheng, Zhaofang,Xia, Minggang,Liu, Shiru,et al. Role of rough substrate on the growth of large single-crystal MoS2 by chemical vapor deposition[J]. APPLIED SURFACE SCIENCE,2019,476:1008-1015. |
APA | Cheng, Zhaofang,Xia, Minggang,Liu, Shiru,Hu, Ruixue,Liang, Gongying,&Zhang, Shengli.(2019).Role of rough substrate on the growth of large single-crystal MoS2 by chemical vapor deposition.APPLIED SURFACE SCIENCE,476,1008-1015. |
MLA | Cheng, Zhaofang,et al."Role of rough substrate on the growth of large single-crystal MoS2 by chemical vapor deposition".APPLIED SURFACE SCIENCE 476(2019):1008-1015. |
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