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Role of rough substrate on the growth of large single-crystal MoS2 by chemical vapor deposition
Cheng, Zhaofang; Xia, Minggang; Liu, Shiru; Hu, Ruixue; Liang, Gongying; Zhang, Shengli
刊名APPLIED SURFACE SCIENCE
2019
卷号476页码:1008-1015
关键词Chemical vapor deposition Large single-crystal MoS2 Rough substrate
ISSN号0169-4332
URL标识查看原文
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/2828683
专题西安交通大学
推荐引用方式
GB/T 7714
Cheng, Zhaofang,Xia, Minggang,Liu, Shiru,et al. Role of rough substrate on the growth of large single-crystal MoS2 by chemical vapor deposition[J]. APPLIED SURFACE SCIENCE,2019,476:1008-1015.
APA Cheng, Zhaofang,Xia, Minggang,Liu, Shiru,Hu, Ruixue,Liang, Gongying,&Zhang, Shengli.(2019).Role of rough substrate on the growth of large single-crystal MoS2 by chemical vapor deposition.APPLIED SURFACE SCIENCE,476,1008-1015.
MLA Cheng, Zhaofang,et al."Role of rough substrate on the growth of large single-crystal MoS2 by chemical vapor deposition".APPLIED SURFACE SCIENCE 476(2019):1008-1015.
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