Optimization of hetero-epitaxial growth for the threading dislocation density reduction of germanium epilayers | |
Haining Chong ; Zhewei Wang ; Chaonan Chen ; Zemin Xu ; Ke Wu ; Lan Wu ; Bo Xu ; Hui Ye | |
刊名 | Journal of Crystal Growth |
2018 | |
卷号 | 488页码:8–15 |
内容类型 | 期刊论文 |
源URL | [http://ir.semi.ac.cn/handle/172111/29124] |
专题 | 半导体研究所_中科院半导体材料科学重点实验室 |
推荐引用方式 GB/T 7714 | Haining Chong ; Zhewei Wang ; Chaonan Chen ; Zemin Xu ; Ke Wu ; Lan Wu ; Bo Xu ; Hui Ye. Optimization of hetero-epitaxial growth for the threading dislocation density reduction of germanium epilayers[J]. Journal of Crystal Growth,2018,488:8–15. |
APA | Haining Chong ; Zhewei Wang ; Chaonan Chen ; Zemin Xu ; Ke Wu ; Lan Wu ; Bo Xu ; Hui Ye.(2018).Optimization of hetero-epitaxial growth for the threading dislocation density reduction of germanium epilayers.Journal of Crystal Growth,488,8–15. |
MLA | Haining Chong ; Zhewei Wang ; Chaonan Chen ; Zemin Xu ; Ke Wu ; Lan Wu ; Bo Xu ; Hui Ye."Optimization of hetero-epitaxial growth for the threading dislocation density reduction of germanium epilayers".Journal of Crystal Growth 488(2018):8–15. |
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