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Bias-dependent High Frequency Characterization of Through-Silicon Via (TSV) for 3D Integration
Sun, Xin ; Fang, Runiu ; Liu, Huan ; Miao, Min ; Jin, Yufeng
2016
关键词Through-silicon via (TSV) S parameter RLGC extraction MOS effect CAPACITANCE VIAS
英文摘要In this paper, high frequency measurement of TSV structures under different DC bias conditions are carried out. The impact of the MOS capacitance effect of TSV on its transmission performance is analyzed. Capacitance and conductance parameters of TSV are extracted and compared with numerical calculations.; CPCI-S(ISTP); sunxin@ime.pku.edu.cn; runiu_fang@163.com
语种英语
出处IEEE MTT-S International Microwave Workshop Series on Advanced Materials and Processes for RF and THz Applications (IMWS-AMP)
内容类型其他
源URL[http://ir.pku.edu.cn/handle/20.500.11897/459897]  
专题信息科学技术学院
推荐引用方式
GB/T 7714
Sun, Xin,Fang, Runiu,Liu, Huan,et al. Bias-dependent High Frequency Characterization of Through-Silicon Via (TSV) for 3D Integration. 2016-01-01.
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