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	Optical limiter for DF Laser based on deep-etched fusedsilica grating
	Yang, Junbo ; Xu, Suzhi ; Zhang, Jingjing ; Wu, Wenjun ; Lu, Huanyu ; Huang, Jie ; Chang, Shengli
	2015
英文摘要	Based on the deep-etched fused-silica grating, an optical limiter for deuterium fluoride (DF) laser is designed. The grating's parameters are optimized by rigorous coupled wave analysis (RCWA), and the structure can be fabricated with recent CMOS technology. The optical limiter has good performance with incident angle between 40 and 50, which is simulated by FDTD under weak light and strong light, respectively. The result shows that the weak incident light almost propagates in the line and the strong incident light changes the propagation direction at right angle through the optical limiter. ? OSA 2015.; EI
语种	英语
出处	Photonics for Energy, PFE 2015
DOI标识	10.1364/OEDI.2015.JW3A.68
内容类型	其他
源URL	[http://ir.pku.edu.cn/handle/20.500.11897/436975]
专题	信息科学技术学院
推荐引用方式 GB/T 7714	Yang, Junbo,Xu, Suzhi,Zhang, Jingjing,et al. Optical limiter for DF Laser based on deep-etched fusedsilica grating. 2015-01-01.

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