Study of silicon-based MEMS technology and its standard process

CORC > 北京大学 > 信息科学技术学院

	Study of silicon-based MEMS technology and its standard process
	Wang, Yang-Yuan ; Wu, Guo-Ying ; Hao, Yi-Long ; Zhang, Da-Cheng ; Xiao, Zhi-Xiong ; Li, Ting ; Zhang, Guo-Bing ; Zhang, Jin-Wen
刊名	tien tzu hsueh paoacta electronica sinica
	2002
英文摘要	The four sets of standard processes developed by Institute of Microelectronics of Peking University are presented. In these four sets of standard process, three of them are bulk micromachining processes and one is surface sacrificial process. The key technologies used in these processes were studied systematically. Research work included: systematically study how to control the stress of polysilicon film; developed two anti-stiction technologies; research of Si/Si bonding, Si/Ni/Si bonding and Si/glass bonding; study and optimisation of high aspect ratio silicon etching; successfully reducing RIE Lag from 23% to 5%; exploiting two kinds of multi-step silicon etching technologies.; EI; 0; 11; 1577-1584; 30
语种	英语
内容类型	期刊论文
源URL	[http://ir.pku.edu.cn/handle/20.500.11897/408224]
专题	信息科学技术学院
推荐引用方式 GB/T 7714	Wang, Yang-Yuan,Wu, Guo-Ying,Hao, Yi-Long,et al. Study of silicon-based MEMS technology and its standard process[J]. tien tzu hsueh paoacta electronica sinica,2002.
APA	Wang, Yang-Yuan.,Wu, Guo-Ying.,Hao, Yi-Long.,Zhang, Da-Cheng.,Xiao, Zhi-Xiong.,...&Zhang, Jin-Wen.(2002).Study of silicon-based MEMS technology and its standard process.tien tzu hsueh paoacta electronica sinica.
MLA	Wang, Yang-Yuan,et al."Study of silicon-based MEMS technology and its standard process".tien tzu hsueh paoacta electronica sinica (2002).