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	Controllable Formation and Optical Characterization of Silicon Nanocone-Forest Using SF6/C4F8 in Cyclic Etching-Passivation Process
	Zhu, Fu-Yun ; Zhang, Xiao-Sheng ; Hu, Wei ; Zhang, Hai-Xia
	2013
关键词	nanocone-forest DRIE controllability low-reflectance
英文摘要	This paper reports a nanocone-forest silicon surface fabricated by an improved DRIE process using SF6/C4F8 in cyclic etching-passivation process, which is maskless, controllable, effective and large-size. As well known, optical property of textured silicon surface is determined mainly by its surface structure, and surface structure is determined by process conditions. In this work, process conditions during the experiment, like etching process parameters, pretreatment uniformity control and patterned silicon etching, are tested and discussed. Based on these controllable process conditions, nanocone-forest with an average height of 0.4 similar to 5 mu m, aspect ratio of 1 similar to 8 and density of 3 similar to 30 per 4 mu m(2) formed. By analyzing the influences of nanostructure parameters on optical property, it's concluded that high aspect ratio, high density and small height of nanostructure could result in ultra-low reflectance. The optical reflectance of two samples has been reduced to below 0.22% and 0.16% of the solar spectrum, respectively.; http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcApp=PARTNER_APP&SrcAuth=LinksAMR&KeyUT=WOS:000327183000222&DestLinkType=FullRecord&DestApp=ALL_WOS&UsrCustomerID=8e1609b174ce4e31116a60747a720701 ; Engineering, Biomedical; Engineering, Electrical & Electronic; Nanoscience & Nanotechnology; EI; CPCI-S(ISTP); 1
语种	英语
DOI标识	10.1109/NEMS.2013.6559899
内容类型	其他
源URL	[http://ir.pku.edu.cn/handle/20.500.11897/405796]
专题	信息科学技术学院
推荐引用方式 GB/T 7714	Zhu, Fu-Yun,Zhang, Xiao-Sheng,Hu, Wei,et al. Controllable Formation and Optical Characterization of Silicon Nanocone-Forest Using SF6/C4F8 in Cyclic Etching-Passivation Process. 2013-01-01.

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