A novel technique of Silicon-on-Nothing MOSFETs fabrication by hydrogen and helium co-implantation | |
Bu, WH ; Huang, R ; Li, M ; Tian, Y ; Wang, YY | |
2004 | |
英文摘要 | In this paper a novel technique of Silicon-on-Nothing (SON) MOSFETs fabrication by H+ and He+ co-implantation is presented for the first time. This in-house technique is compatible with conventional CMOS technology and it can greatly alleviate the problems existing in the known techniques of SON devices. SON nMOSFETs with 50nm gate length have been fabricated and demonstrated in this paper. With the same process condition.. SON MOSFETs exhibit better performance than the corresponding bulk silicon. MOSFETs.; Engineering, Electrical & Electronic; Materials Science, Multidisciplinary; Physics, Condensed Matter; CPCI-S(ISTP); 0 |
语种 | 英语 |
内容类型 | 其他 |
源URL | [http://ir.pku.edu.cn/handle/20.500.11897/293732] |
专题 | 信息科学技术学院 |
推荐引用方式 GB/T 7714 | Bu, WH,Huang, R,Li, M,et al. A novel technique of Silicon-on-Nothing MOSFETs fabrication by hydrogen and helium co-implantation. 2004-01-01. |
个性服务 |
查看访问统计 |
相关权益政策 |
暂无数据 |
收藏/分享 |
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。
修改评论