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Highly sensitive seesaw capacitive pressure sensor based on SOI wafer
Yang, C. C. ; Zhao, Q. ; Gao, C. C. ; Liu, G. D. ; Zhang, Y. X. ; Cui, W. P. ; Hao, Y. L.
刊名electronics letters
2014
DOI10.1049/el.2013.4170
英文摘要A novel microelectromechanical system capacitive pressure sensor with two wings, which amplify the mechanical deformation of the pressure sensing diaphragm and increase the sensor's sensitivity, is presented. This seesaw structure is available for both single and differential capacitive pressure sensors. To verify this design, a single capacitive pressure sensor is manufactured based on silicon on a insulator (SOI) wafer. The test result shows that this pressure sensor has a sensitivity of 7.75 fF/kPa.; Engineering, Electrical & Electronic; SCI(E); EI; 0; ARTICLE; gaocc@pku.edu.cn; 5; 376-+; 50
语种英语
内容类型期刊论文
源URL[http://ir.pku.edu.cn/handle/20.500.11897/291644]  
专题信息科学技术学院
推荐引用方式
GB/T 7714
Yang, C. C.,Zhao, Q.,Gao, C. C.,et al. Highly sensitive seesaw capacitive pressure sensor based on SOI wafer[J]. electronics letters,2014.
APA Yang, C. C..,Zhao, Q..,Gao, C. C..,Liu, G. D..,Zhang, Y. X..,...&Hao, Y. L..(2014).Highly sensitive seesaw capacitive pressure sensor based on SOI wafer.electronics letters.
MLA Yang, C. C.,et al."Highly sensitive seesaw capacitive pressure sensor based on SOI wafer".electronics letters (2014).
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