CORC  > 北京大学  > 化学与分子工程学院
The transition metal surface passivated edges of hexagonal boron nitride (h-BN) and the mechanism of h-BN's chemical vapor deposition (CVD) growth
Zhao, Ruiqi ; Li, Feifei ; Liu, Zhirong ; Liuc, Zhongfan ; Ding, Feng
刊名PHYSICAL CHEMISTRY CHEMICAL PHYSICS
2015
关键词SCANNING-TUNNELING-MICROSCOPY CORRUGATED MONOLAYER EMBEDDED GRAPHENE CRYSTALLINE NANOMESH PHOTODETECTORS LAYER FOIL
DOI10.1039/c5cp04833h
英文摘要Edge structure and stability are crucial in determining both the morphology and the growth behaviours of hexagonal boron nitride (h-BN) domains in chemical vapour deposition (CVD) growth under near thermal equilibrium conditions. In this study, various edges of h-BN on three typical transition metal surfaces used for h-BN's CVD growth, Cu(111), Ni(111) and Rh(111), are explored with density functional theory calculations. Different from that in vacuum, our study shows that the formation of non-hexagonal rings, such as pentagon, heptagon or their pairs, is energetically not preferred and both zigzag (ZZ) edges are more stable than the armchair (AC) edge on all the explored catalyst surfaces under typical conditions of h-BN's CVD growth, which explains the broad experimental observation of triangular h-BN domains. More importantly, our results indicate that, instead of the pristine ZZ edge terminated with nitrogen atoms (ZZN), the triangular BN domains observed in experiments are likely to be enclosed with ZZ Klein edges having dangling atoms, ZZB + N or ZZN + B. By applying the theory of Wulff construction, we predicted that the equilibrium shape of a BN domain could be a hexagon enclosed with nitrogen-rich AC edges, triangles enclosed with two different types of ZZ Klein edges or a hexagon enclosed with boron-rich AC edges if the growth is in a N-rich, neutral or B-rich environment, respectively. This study presents how the edges and equilibrium shapes of h-BN domains can be controlled during the CVD synthesis and provides guidelines for further exploring the growth behaviours and improving the quality of CVD-prepared h-BN films.; Natural Science Foundation of China [21303041]; Beijing National Laboratory for Molecular Sciences [2013006]; NSFC [21373015]; high-performance grid computing platform of Henan Polytechnic University; SCI(E); ARTICLE; feng.ding@polyu.edu.hk; 43; 29327-29334; 17
语种英语
内容类型期刊论文
源URL[http://ir.pku.edu.cn/handle/20.500.11897/420992]  
专题化学与分子工程学院
推荐引用方式
GB/T 7714
Zhao, Ruiqi,Li, Feifei,Liu, Zhirong,et al. The transition metal surface passivated edges of hexagonal boron nitride (h-BN) and the mechanism of h-BN's chemical vapor deposition (CVD) growth[J]. PHYSICAL CHEMISTRY CHEMICAL PHYSICS,2015.
APA Zhao, Ruiqi,Li, Feifei,Liu, Zhirong,Liuc, Zhongfan,&Ding, Feng.(2015).The transition metal surface passivated edges of hexagonal boron nitride (h-BN) and the mechanism of h-BN's chemical vapor deposition (CVD) growth.PHYSICAL CHEMISTRY CHEMICAL PHYSICS.
MLA Zhao, Ruiqi,et al."The transition metal surface passivated edges of hexagonal boron nitride (h-BN) and the mechanism of h-BN's chemical vapor deposition (CVD) growth".PHYSICAL CHEMISTRY CHEMICAL PHYSICS (2015).
个性服务
查看访问统计
相关权益政策
暂无数据
收藏/分享
所有评论 (0)
暂无评论
 

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。


©版权所有 ©2017 CSpace - Powered by CSpace