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A Roadmap for Controlled Production of Topological Insulator Nanostructures and Thin Films
Guo, Yunfan ; Liu, Zhongfan ; Peng, Hailin
刊名SMALL
2015
关键词topological insulators nanostructures synthesis surface states bulk carriers DER-WAALS EPITAXY CHEMICAL-VAPOR-DEPOSITION MOLECULAR-BEAM EPITAXY HGTE QUANTUM-WELLS BISMUTH TELLURIDE BI2SE3 NANORIBBONS SOLVOTHERMAL SYNTHESIS TRANSPORT-PROPERTIES SURFACE CONDUCTION GROWTH
DOI10.1002/smll.201403426
英文摘要The group V-VI chalcogenide semiconductors (Bi2Se3, Bi2Te3, and Sb2Te3) have long been known as thermoelectric materials. Recently, they have been once more generating interest because Bi2Se3, Bi2Te3 and Sb2Te3 have been crowned as 3D topological insulators (TIs), which have insulating bulk gaps and metallic Dirac surface states. One big challenge in the study of TIs is the lack of high-quality materials with few defects and insulating bulk states. To manifest the topological surface states, it is critical to suppress the contribution from the bulk carriers. Controlled production of TI nanostructures that have a large surface-to-volume ratio is an efficient way to reduce the bulk conductance and to significantly enhance the topological surface conduction. In this review article, the recent progress on the preparation of TI nanostructures is highlighted. Basic production methods for TI nanostructures are introduced in detail. Furthermore, several specific production approaches to reduce the residual bulk carriers from defects are summarized. Finally, the progress and the prospects of the production of TI-based heterostructures, which hold promise in both fundamental study and novel applications are discussed.; National Basic Research Program of China [2014CB932500, 2011CB921904, 2013CB932603]; National Natural Science Foundation of China [21173004, 21222303, 51121091]; National Program for Support of Top-Notch Young Professionals; SCI(E); EI; REVIEW; zfliu@pku.edu.cn; hlpeng@pku.edu.cn; 27,SI; 3290-3305; 11
语种英语
内容类型期刊论文
源URL[http://ir.pku.edu.cn/handle/20.500.11897/418371]  
专题化学与分子工程学院
推荐引用方式
GB/T 7714
Guo, Yunfan,Liu, Zhongfan,Peng, Hailin. A Roadmap for Controlled Production of Topological Insulator Nanostructures and Thin Films[J]. SMALL,2015.
APA Guo, Yunfan,Liu, Zhongfan,&Peng, Hailin.(2015).A Roadmap for Controlled Production of Topological Insulator Nanostructures and Thin Films.SMALL.
MLA Guo, Yunfan,et al."A Roadmap for Controlled Production of Topological Insulator Nanostructures and Thin Films".SMALL (2015).
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