Nanosphere Lithography at the Gas/Liquid Interface: A General Approach   toward Free-Standing High-Quality Nanonets

doi:10.1021/cm9031946

CORC > 北京大学 > 化学与分子工程学院

	Nanosphere Lithography at the Gas/Liquid Interface: A General Approach toward Free-Standing High-Quality Nanonets
	Li, Cheng ; Hong, Guosong ; Qi, Limin
刊名	chemistry of materials
	2010
关键词	EXTRAORDINARY OPTICAL-TRANSMISSION MONOLAYER COLLOIDAL CRYSTALS POROUS MEMBRANES CURVED SURFACES METAL-FILMS ARRAYS FABRICATION TEMPLATE GROWTH NANOFABRICATION
DOI	10.1021/cm9031946
英文摘要	A general nanosphere lithography (NSL) approach toward Facile fabrication of Free-standing large-area, high-quality nanonets was developed, which was based oil a floating colloidal crystal monolayer (CCM) mask at the gas/liquid interface for materials deposition via interfacial reactions. The hole size. spacing, and thickness of the highly ordered nanonets. which showed interesting photonic properties, can he readily adjusted. This NSL approach at the gas/liquid interface can be easily extended to fabricate large-area ordered nanonets of various metal sulfides, metals as well as inorganic minerals. Furthermore, a variety of ordered gold nanoarrays with Unusual patterns were produced by using nanonet bilayers as unique deposition masks, suggesting that the obtained transferable, high-quality nanonets can function as versatile lithographic masks to generate novel nanopatterns.; http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcApp=PARTNER_APP&SrcAuth=LinksAMR&KeyUT=WOS:000273580700026&DestLinkType=FullRecord&DestApp=ALL_WOS&UsrCustomerID=8e1609b174ce4e31116a60747a720701 ; Chemistry, Physical; Materials Science, Multidisciplinary; SCI(E); 48; ARTICLE; 2; 476-481; 22
语种	英语
内容类型	期刊论文
源URL	[http://ir.pku.edu.cn/handle/20.500.11897/245529]
专题	化学与分子工程学院
推荐引用方式 GB/T 7714	Li, Cheng,Hong, Guosong,Qi, Limin. Nanosphere Lithography at the Gas/Liquid Interface: A General Approach toward Free-Standing High-Quality Nanonets[J]. chemistry of materials,2010.
APA	Li, Cheng,Hong, Guosong,&Qi, Limin.(2010).Nanosphere Lithography at the Gas/Liquid Interface: A General Approach toward Free-Standing High-Quality Nanonets.chemistry of materials.
MLA	Li, Cheng,et al."Nanosphere Lithography at the Gas/Liquid Interface: A General Approach toward Free-Standing High-Quality Nanonets".chemistry of materials (2010).