A method to fabricate high-aspect-ratio microstructures using PMMA photoresist

doi:10.1007/s00542-017-3490-x

	A method to fabricate high-aspect-ratio microstructures using PMMA photoresist
	Zhou, Y; Zhang TC(张天冲); Yi FT(伊福廷); Wang B(王波); Liu J(刘静); Wang YT(王雨婷); Zhou Y(周悦); Zhang, TC; Yi, FT; Wang, B
刊名	MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS
	2018
卷号	24 期号:2 页码:1223-1226
ISSN号	0946-7076
DOI	10.1007/s00542-017-3490-x
文献子类	Article
英文摘要	Fabrications of high-aspect-ratio microstructures (HARMS) using negative photoresist have been studied a lot by researchers recently, but the removal of the resist is still a problem. We report a method to fabricate HARMS using PMMA, a positive photoresist. A classical microstructure, densely packed micro square columns, was tried in our study. A top grid made of negative photoresists was employed to join all the separate parts together to prevent them from tilting or clumping. The development and electroplating processes were not influenced by the top grid. Excellent nickel micro-pores-structures were obtained finally, demonstrating that the method is a promising way to fabricate HARMS especially when the resist needs to be removed.
电子版国际标准刊号	1432-1858
WOS关键词	X-RAY-LITHOGRAPHY ; SU-8 PHOTORESIST ; REMOVAL ; RESIST
WOS研究方向	Engineering ; Science & Technology - Other Topics ; Materials Science ; Physics
语种	英语
WOS记录号	WOS:000423697800041
内容类型	期刊论文
源URL	[http://ir.ihep.ac.cn/handle/311005/285582]
专题	高能物理研究所_多学科研究中心
通讯作者	Zhang TC(张天冲)
作者单位	中国科学院高能物理研究所
推荐引用方式 GB/T 7714	Zhou, Y,Zhang TC,Yi FT,et al. A method to fabricate high-aspect-ratio microstructures using PMMA photoresist[J]. MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS,2018,24(2):1223-1226.
APA	Zhou, Y.,张天冲.,伊福廷.,王波.,刘静.,...&Wang, YT.(2018).A method to fabricate high-aspect-ratio microstructures using PMMA photoresist.MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS,24(2),1223-1226.
MLA	Zhou, Y,et al."A method to fabricate high-aspect-ratio microstructures using PMMA photoresist".MICROSYSTEM TECHNOLOGIES-MICRO-AND NANOSYSTEMS-INFORMATION STORAGE AND PROCESSING SYSTEMS 24.2(2018):1223-1226.