Effect of background pressure on Co/C multilayers

doi:10.1364/AO.56.000C16

	Effect of background pressure on Co/C multilayers
	Wang, ZS; Wen, MW; Cui, MQ; Wang, DL; Zhang, Z; Li, P; Jiang, L; Wang DL(王得来); Ma, S; Cui MQ(崔明启)
刊名	APPLIED OPTICS
	2017
卷号	56 期号:4 页码:C16-C20
ISSN号	1559-128X
DOI	10.1364/AO.56.000C16
文献子类	Article
英文摘要	Co/C multilayers with a period thickness of 3.54 nm and 30 bilayers were deposited by direct current magnetron sputtering with different background pressures. The effects of residual background gases were investigated. The films were characterized by using grazing incidence hard x-ray reflectivity, soft x-ray reflectivity, and x-ray photoelectron spectroscopy. The results indicate that the x-ray reflectivity of Co/C multilayers decreases with increasing background pressure as well as the increasing interlayer roughness. The inclusion of more residual background air increases the interdiffusion of Co and C layers. (C) 2016 Optical Society of America
电子版国际标准刊号	2155-3165
WOS关键词	FILMS ; RADIATION ; EVOLUTION ; MODEL
WOS研究方向	Optics
语种	英语
CSCD记录号	CSCD:6120971
WOS记录号	WOS:000394309200003
内容类型	期刊论文
源URL	[http://ir.ihep.ac.cn/handle/311005/284721]
专题	高能物理研究所_实验物理中心高能物理研究所_多学科研究中心
作者单位	中国科学院高能物理研究所
推荐引用方式 GB/T 7714	Wang, ZS,Wen, MW,Cui, MQ,et al. Effect of background pressure on Co/C multilayers[J]. APPLIED OPTICS,2017,56(4):C16-C20.
APA	Wang, ZS.,Wen, MW.,Cui, MQ.,Wang, DL.,Zhang, Z.,...&Huang, QS.(2017).Effect of background pressure on Co/C multilayers.APPLIED OPTICS,56(4),C16-C20.
MLA	Wang, ZS,et al."Effect of background pressure on Co/C multilayers".APPLIED OPTICS 56.4(2017):C16-C20.