Intense gamma ray generated by refocusing laser pulse on wakefield accelerated electrons

doi:10.1063/1.4994710

CORC > 高能物理研究所 > 中国科学院高能物理研究所 > 核技术应用研究中心

	Intense gamma ray generated by refocusing laser pulse on wakefield accelerated electrons
	Li DZ(李大章); Chen, LM; Wang, WM; Li, DZ; He, YH; Li, MH; Zhu, CQ; Li, YF; Wang, JG; Feng, J
刊名	PHYSICS OF PLASMAS
	2017
卷号	24 期号:9 页码:93110
ISSN号	1070-664X
DOI	10.1063/1.4994710
文献子类	Article
英文摘要	Ultrafast x/gamma ray emission from the combination of laser wake-field acceleration and plasma mirror has been investigated as a promising Thomson scattering source. However, the photon energy and yield of radiation are limited to the intensity of reflected laser pulses. We use the 2D particle in cell simulation to demonstrate that a 75TW driven laser pulse can be refocused on the accelerated electron bunches through a hemispherical plasma mirror with a small f number of 0.25. The energetic electrons with the maximum energy about 350 MeV collide with the reflected laser pulse of a(0) = 3.82 at the focal spot, producing high order multi-photon Thomson scattering, and resulting in the scattering spectrum which extends up to 21.2 MeV. Such a high energy gamma ray source could be applied to photonuclear reaction and materials science. Published by AIP Publishing.
电子版国际标准刊号	1089-7674
WOS关键词	NONLINEAR THOMSON SCATTERING ; RELATIVISTIC ELECTRONS ; BEAMS ; DRIVEN
WOS研究方向	Physics
语种	英语
WOS记录号	WOS:000412107400080
内容类型	期刊论文
源URL	[http://ir.ihep.ac.cn/handle/311005/284904]
专题	高能物理研究所_核技术应用研究中心高能物理研究所_加速器中心
作者单位	中国科学院高能物理研究所
推荐引用方式 GB/T 7714	Li DZ,Chen, LM,Wang, WM,et al. Intense gamma ray generated by refocusing laser pulse on wakefield accelerated electrons[J]. PHYSICS OF PLASMAS,2017,24(9):93110.
APA	李大章.,Chen, LM.,Wang, WM.,Li, DZ.,He, YH.,...&Feng, J.(2017).Intense gamma ray generated by refocusing laser pulse on wakefield accelerated electrons.PHYSICS OF PLASMAS,24(9),93110.
MLA	李大章,et al."Intense gamma ray generated by refocusing laser pulse on wakefield accelerated electrons".PHYSICS OF PLASMAS 24.9(2017):93110.