Plasmonic direct writing lithography with a macroscopical contact probe
Huang, Yuerong1; Liu, Ling2; Wang, Changtao2; Chen, Weidong1; Liu, Yunyue1; Li, Ling1
刊名APPLIED SURFACE SCIENCE
2018-05-31
卷号441页码:99-104
关键词Nanolithography Surface plasmons Nanostructure Contact probe
ISSN号0169-4332
DOI10.1016/j.apsusc.2018.01.304
文献子类J
英文摘要In this work, we design a plasmonic direct writing lithography system with a macroscopical contact probe to achieve nanometer scale spots. The probe with bowtie-shaped aperture array adopts spring hinge and beam deflection method (BDM) to realize near-field lithography. Lithography results show that a macroscopical plasmonic contact probe can achieve a patterning resolution of around 75 nm at 365 nm wavelength, and demonstrate that the lithography system is promising for practical applications due to beyond the diffraction limit, low cost, and simplification of system configuration. CST calculations provide a guide for the design of recording structure and the arrangement of placing polarizer. (C) 2018 Elsevier B.V. All rights reserved.
语种英语
WOS记录号WOS:000427816400012
内容类型期刊论文
源URL[http://ir.ioe.ac.cn/handle/181551/9379]  
专题光电技术研究所_微细加工光学技术国家重点实验室(开放室)
作者单位1.College of Physics and Electronic Engineering, Sichuan Normal University, Chengdu; 610101, China;
2.State Key Laboratory of Optical Technologies on Nano-Fabricatiom and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Sciences, P.O. Box 350, Chengdu; 610209, China
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GB/T 7714
Huang, Yuerong,Liu, Ling,Wang, Changtao,et al. Plasmonic direct writing lithography with a macroscopical contact probe[J]. APPLIED SURFACE SCIENCE,2018,441:99-104.
APA Huang, Yuerong,Liu, Ling,Wang, Changtao,Chen, Weidong,Liu, Yunyue,&Li, Ling.(2018).Plasmonic direct writing lithography with a macroscopical contact probe.APPLIED SURFACE SCIENCE,441,99-104.
MLA Huang, Yuerong,et al."Plasmonic direct writing lithography with a macroscopical contact probe".APPLIED SURFACE SCIENCE 441(2018):99-104.
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