Polarization-insensitive meta-lens doublet with large view field in the ultraviolet region
He, Dewei; Zhang, Fei; Wang, Yanqin; Li, Zhu; Ma, Xiaoliang; Zhao, Zeyu; Li, Xiong; Wang, Changtao; Guo, Yinghui; Pu, Mingbo
2018
会议日期JUN 26-29, 2018JUN 26-29, 2018
会议地点Chengdu, PEOPLES R CHINAChengdu, PEOPLES R CHINA
关键词meta-lens doublet ultraviolet light polarization-insensitive diffraction-limited large view field
卷号10841
DOI10.1117/12.2505584
页码108411A
英文摘要Dielectric metasurfaces is a plane optical device to achieve the desired function by modulating amplitude and phase, polarization for the incident light, and its transmission efficiency is higher than other metasurfaces, these advantages lead to dielectric metasurfaces will be used widely in the future. Nevertheless, the majority of metasurfaces are planar single-layered structure, which limit seriously the view field and effect of monochromatic imaging. Here, we demonstrate a composed dielectric meta-lens doublet by the electromagnetic simulation can achieve perfectly diffraction-limited monochromatic focus for the polarization-insensitive incident lights at a wavelength of 375 nm, which has the view field of 60 degrees, the numerical aperture of 0.5, and a focal length of 380 mu m. Due to the dielectric meta-lens doublet has the scaling of subwavelength at ultraviolet light, and the devices have high distinguishability, it can be used widely in nanolithography, imaging with large view field, and other optical domains.
会议录Proceedings of SPIE - 9TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES (AOMATT 2018): META-SURFACE-WAVE AND PLANAR OPTICS
文献子类C
语种英语
ISSN号0277-786X
WOS记录号WOS:000461820700044
WOS关键词ALL-DIELECTRIC METASURFACE ; HIGH-EFFICIENCY ; BAND
内容类型会议论文
源URL[http://ir.ioe.ac.cn/handle/181551/9149]  
专题光电技术研究所_微细加工光学技术国家重点实验室(开放室)
推荐引用方式
GB/T 7714
He, Dewei,Zhang, Fei,Wang, Yanqin,et al. Polarization-insensitive meta-lens doublet with large view field in the ultraviolet region[C]. 见:. Chengdu, PEOPLES R CHINAChengdu, PEOPLES R CHINA. JUN 26-29, 2018JUN 26-29, 2018.
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