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Electron-induced gasification reactions in the fabrication process on graphite surface using scanning tunneling microscopy
Wu, J; Wang, C; Qiu, XH; Shang, GY; Wang, NX; Bai, CL
刊名JOURNAL OF APPLIED PHYSICS
1999-08-15
卷号86期号:4页码:2342-2345
ISSN号0021-8979
英文摘要We have studied the dependence of nanofabrication on the pulse duration explicitly with scanning tunneling microscopy, using graphite as an example. It is demonstrated that, under comparable conditions, the depth of the as-generated craters has monotonic correlation with the pulse duration, while the apparent surface diameters do not show significant changes. This is believed to be direct evidence that the electron-induced gasification reaction of the carbon atoms did occur during fabrication, rather than field evaporation mechanism. The removal rate of the carbon atoms is estimated to be on the order of 10(5)/s. In addition, the characteristics of the fabrication is shown to be related to the specific reaction type. (C) 1999 American Institute of Physics. [S0021-8979(99)02916-3].
语种英语
出版者AMER INST PHYSICS
WOS记录号WOS:000081720600088
内容类型期刊论文
源URL[http://ir.iccas.ac.cn/handle/121111/75549]  
专题中国科学院化学研究所
通讯作者Wu, J
作者单位Chinese Acad Sci, Inst Chem, Beijing 100080, Peoples R China
推荐引用方式
GB/T 7714
Wu, J,Wang, C,Qiu, XH,et al. Electron-induced gasification reactions in the fabrication process on graphite surface using scanning tunneling microscopy[J]. JOURNAL OF APPLIED PHYSICS,1999,86(4):2342-2345.
APA Wu, J,Wang, C,Qiu, XH,Shang, GY,Wang, NX,&Bai, CL.(1999).Electron-induced gasification reactions in the fabrication process on graphite surface using scanning tunneling microscopy.JOURNAL OF APPLIED PHYSICS,86(4),2342-2345.
MLA Wu, J,et al."Electron-induced gasification reactions in the fabrication process on graphite surface using scanning tunneling microscopy".JOURNAL OF APPLIED PHYSICS 86.4(1999):2342-2345.
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