Plasma-enhanced chemical vapour deposition of inorganic nanomaterials using a chloride precursor

doi:10.1088/0022-3727/44/17/174015

CORC > 化学研究所 > 中国科学院化学研究所

	Plasma-enhanced chemical vapour deposition of inorganic nanomaterials using a chloride precursor
	Yang, Rong; Zheng, Jie; Li, Wei; Qu, Jianglan; Li, Xingguo
刊名	JOURNAL OF PHYSICS D-APPLIED PHYSICS
	2011-05-04
卷号	44 期号:17
ISSN号	0022-3727
DOI	10.1088/0022-3727/44/17/174015
英文摘要	Plasmas have been widely used for the fabrication of nanomaterials owing to their unique properties in chemical reactions. The plasma-enhanced chemical vapour deposition (PECVD) technique has been applied to produce a large variety of materials. In this perspective, we take a look at the progress made in the research of PECVD using chloride precursors in the last decade. We discuss the advantage of using a plasma compared with the thermal chemical vapour deposition technique and emphasize the special effects of plasma on nanomaterial fabrications in the PECVD technique, including kinetic and thermodynamic effects. We also outline the current challenges for this technique, and attempt to offer our personal opinion on the future applications of the PECVD technique with chloride precursors.
语种	英语
出版者	IOP PUBLISHING LTD
WOS记录号	WOS:000289512700015
内容类型	期刊论文
源URL	[http://ir.iccas.ac.cn/handle/121111/72633]
专题	中国科学院化学研究所
通讯作者	Yang, Rong
作者单位	Peking Univ, BNLMS, State Key Lab Rare Earth Mat Chem & Applicat, Coll Chem & Mol Engn, Beijing 100871, Peoples R China
推荐引用方式 GB/T 7714	Yang, Rong,Zheng, Jie,Li, Wei,et al. Plasma-enhanced chemical vapour deposition of inorganic nanomaterials using a chloride precursor[J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS,2011,44(17).
APA	Yang, Rong,Zheng, Jie,Li, Wei,Qu, Jianglan,&Li, Xingguo.(2011).Plasma-enhanced chemical vapour deposition of inorganic nanomaterials using a chloride precursor.JOURNAL OF PHYSICS D-APPLIED PHYSICS,44(17).
MLA	Yang, Rong,et al."Plasma-enhanced chemical vapour deposition of inorganic nanomaterials using a chloride precursor".JOURNAL OF PHYSICS D-APPLIED PHYSICS 44.17(2011).