Large area growth of monolayer MoS2 film on quartz and its use as a saturable absorber in laser mode-locking

	Large area growth of monolayer MoS2 film on quartz and its use as a saturable absorber in laser mode-locking
	Wei-fang Zhao; Hua Yu; Meng-zhou Liao; Ling Zhang; Shu-zhen Zou; Hai-juan Yu; Chao-jian He; Jing-yuan Zhang; Guang-yu Zhang; Xue-chun Lin
刊名	Semiconductor Science and Technology
	2017
卷号	32 期号:2017 页码:025013 (6pp)
学科主题	半导体器件
公开日期	2018-11-30
内容类型	期刊论文
源URL	[http://ir.semi.ac.cn/handle/172111/28828]
专题	半导体研究所_全固态光源实验室
推荐引用方式 GB/T 7714	Wei-fang Zhao,Hua Yu,Meng-zhou Liao,et al. Large area growth of monolayer MoS2 film on quartz and its use as a saturable absorber in laser mode-locking[J]. Semiconductor Science and Technology,2017,32(2017):025013 (6pp).
APA	Wei-fang Zhao.,Hua Yu.,Meng-zhou Liao.,Ling Zhang.,Shu-zhen Zou.,...&Xue-chun Lin.(2017).Large area growth of monolayer MoS2 film on quartz and its use as a saturable absorber in laser mode-locking.Semiconductor Science and Technology,32(2017),025013 (6pp).
MLA	Wei-fang Zhao,et al."Large area growth of monolayer MoS2 film on quartz and its use as a saturable absorber in laser mode-locking".Semiconductor Science and Technology 32.2017(2017):025013 (6pp).