The effects of Ag particle morphology on the antireflective properties of silicon textured using Ag-assisted chemical etching

doi:10.1016/j.jallcom.2016.02.019

	The effects of Ag particle morphology on the antireflective properties of silicon textured using Ag-assisted chemical etching
	Wu, Yi 1,2; Gao, Fei 2; Wu, Huijun 2; Liu, Xiaojing 2; Zheng, Xiaoyao 2; Liu, Shengzhong (Frank)2,3,4; Wang, Haoshi 2; Zhou, Songjie 1,2; Li, Fuxian 2
刊名	JOURNAL OF ALLOYS AND COMPOUNDS
	2016-06-15
卷号	670 页码:156-160
关键词	Semiconductors Nanostructured Materials Nanofabrications Surfaces And Interfaces Light Absorption And Reflection
ISSN号	0925-8388
DOI	10.1016/j.jallcom.2016.02.019
文献子类	Article
英文摘要	Metal assisted chemical etching (MaCE) of silicon wafers is of interest for fabrication of antireflective layers for single-crystal Si solar cells. This paper presents an Ag-assisted chemical etching approach for single-crystal Si that generates wafer scale micro-and nano-porous textures with controlled surface morphologies and reflectance properties. The approach begins with an Ag thin film annealing process to form Ag micro- and nanoparticles on the Si substrate. This is followed by MaCE, where the Ag particles serve as a catalyst to produce a micro-and nano-porous texture on the Si surface. The morphology of the fabricated Si micro-and nanopores is controlled in accordance with the size and shape of the Ag particles, which are tuned by annealing the Ag films at different temperatures from 300 to 800 degrees C. The reflectance of the Si surface is in turn determined by the morphology of the etched texture. The fabricated Si antireflective textures have compound hierarchical structures, and an average reflectance of similar to 4.7% is obtained when the Ag film is annealed at 600 degrees C. (C) 2016 Elsevier B.V. All rights reserved.
WOS关键词	SOLAR-CELLS ; SILVER NANOPARTICLES ; POROUS SILICON ; DEPOSITION ; CATALYSTS ; TIO2 ; NANOSTRUCTURES ; NANOHOLES ; ARRAYS ; FILMS
WOS研究方向	Chemistry ; Materials Science ; Metallurgy & Metallurgical Engineering
语种	英语
出版者	ELSEVIER SCIENCE SA
WOS记录号	WOS:000371765800021
内容类型	期刊论文
源URL	[http://cas-ir.dicp.ac.cn/handle/321008/171080]
专题	大连化学物理研究所_中国科学院大连化学物理研究所
通讯作者	Gao, Fei
作者单位	1.Engn Univ Armed Police Force, Coll Sci, Xian 710086, Peoples R China 2.Shaanxi Normal Univ, Inst Adv Energy Mat, Sch Mat Sci & Engn, Xian 710119, Peoples R China 3.Chinese Acad Sci, Dalian Inst Chem Phys, Dalian Natl Lab Clean Energy, Dalian 116023, Peoples R China 4.United Solar Ovon LLC, Troy, MI 48084 USA
推荐引用方式 GB/T 7714	Wu, Yi,Gao, Fei,Wu, Huijun,et al. The effects of Ag particle morphology on the antireflective properties of silicon textured using Ag-assisted chemical etching[J]. JOURNAL OF ALLOYS AND COMPOUNDS,2016,670:156-160.
APA	Wu, Yi.,Gao, Fei.,Wu, Huijun.,Liu, Xiaojing.,Zheng, Xiaoyao.,...&Li, Fuxian.(2016).The effects of Ag particle morphology on the antireflective properties of silicon textured using Ag-assisted chemical etching.JOURNAL OF ALLOYS AND COMPOUNDS,670,156-160.
MLA	Wu, Yi,et al."The effects of Ag particle morphology on the antireflective properties of silicon textured using Ag-assisted chemical etching".JOURNAL OF ALLOYS AND COMPOUNDS 670(2016):156-160.