Fabrication and study of phosphor doped hydrogenated nano-crystalline silicon film | |
Liu, M; Wang, ZO; Xi, ZH; He, YL | |
刊名 | Acta physica sinica |
2000-05-01 | |
卷号 | 49期号:5页码:983-988 |
ISSN号 | 1000-3290 |
通讯作者 | Liu, m() |
英文摘要 | Phosphor-doped nc-si:h(nc-si:h(p)) films were obtained by plasma enhanced chemical vapor deposition. the structural characteristics of nc-si:h(p) films were investigated by means of scanning tunneling microscopy, raman scattering, fourier transform, infrared absorption spectroscopy, electron spin resonance and resonant nuclear reaction techniques. the measurements showed that the nc-si:h(p) films have two-phase structure and the grains were embedded in the amorphous matrix. it was found that the grain size of the nc-si:h(p) films was about 2.5-4.5nm,which was smaller than that of nc-si:h films (about 3-6nm). it was also found that the optical absorption coefficient was quite high and the optical gap e-g(opt) was in a range of 1.73-1.78 ev, which was almost the same as that of nc-si:h films. the conductivity of nc-si:h(p) films was in the range of 10(-1)-10(1) ohm(-1.)cm(-1), two magnitudes higher than that of nc-si:h films and the maximum room-temperature conductivity reached to 50.5 ohm(-1).cm(-1). the activation energy of conductivity of the nc-si:h(p) films was in the range of 0.01-0.03 ev, lower than that of nc-si:h film. |
WOS研究方向 | Physics |
WOS类目 | Physics, Multidisciplinary |
语种 | 英语 |
出版者 | CHINESE PHYSICAL SOC |
WOS记录号 | WOS:000087025700031 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/2428835 |
专题 | 半导体研究所 |
通讯作者 | Liu, M |
作者单位 | 1.Chinese Acad Sci, Microelect Res & Dev Ctr, Beijing 100029, Peoples R China 2.Peking Univ, Microelect Res & Dev Ctr, Beijing 100871, Peoples R China 3.Peking Univ, Dept Elect, Beijing 100871, Peoples R China 4.Nanjing Univ, Key Lab Solid Microstruct Phys, Nanjing 210093, Peoples R China |
推荐引用方式 GB/T 7714 | Liu, M,Wang, ZO,Xi, ZH,et al. Fabrication and study of phosphor doped hydrogenated nano-crystalline silicon film[J]. Acta physica sinica,2000,49(5):983-988. |
APA | Liu, M,Wang, ZO,Xi, ZH,&He, YL.(2000).Fabrication and study of phosphor doped hydrogenated nano-crystalline silicon film.Acta physica sinica,49(5),983-988. |
MLA | Liu, M,et al."Fabrication and study of phosphor doped hydrogenated nano-crystalline silicon film".Acta physica sinica 49.5(2000):983-988. |
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