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	Effects of crystalline quality on the ultraviolet emission and electrical properties of the zno films deposited by magnetron sputtering
	You, J. B.; Zhang, X. W.; Fan, Y. M.; Yin, Z. G.; Cai, F.; Chen, N. F.
刊名	Applied surface science
	2009-03-15
卷号	255期号:11页码:5876-5880
关键词	Crystal quality Rf magnetron sputtering Zinc oxide Semiconducting ii-vi materials
ISSN号	0169-4332
DOI	10.1016/j.apsusc.2009.01.024
通讯作者	Zhang, x. w.(xwzhang@semi.ac.cn)
英文摘要	The zno films were deposited on c-plane sapphire, si (0 0 1) and mgal2o4 (1 1 1) substrates in pure ar ambient at different substrate temperatures ranging from 400 to 750 degrees c by radio frequency magnetron sputtering. x-ray diffraction, photoluminescence and hall measurements were used to evaluate the growth temperature and the substrate effects on the properties of zno films. the results show that the crystalline quality of the zno films improves with increasing the temperature up to 600 degrees c, the crystallinity of the films is degraded as the growth temperature increasing further, and the zno film with the best crystalline quality is obtained on sapphire at 600 degrees c. the intensity of the photoluminescence and the electrical properties strongly depend on the crystalline quality of the zno films. the zno films with the better crystallinity have the stronger ultraviolet emission, the higher mobility and the lower residual carrier concentration. the effects of crystallinity on light emission and electrical properties, and the possible origin of the n-type conductivity of the undoped zno films are also discussed. (c) 2009 elsevier b. v. all rights reserved.
WOS关键词	MOLECULAR-BEAM EPITAXY ; PULSED-LASER DEPOSITION ; C-PLANE SAPPHIRE ; OXIDE THIN-FILMS ; ZINC-OXIDE ; GRAIN-SIZE ; GROWTH ; PHOTOLUMINESCENCE ; HYDROGEN ; AMBIENT
WOS研究方向	Chemistry ; Materials Science ; Physics
WOS类目	Chemistry, Physical ; Materials Science, Coatings & Films ; Physics, Applied ; Physics, Condensed Matter
语种	英语
出版者	ELSEVIER SCIENCE BV
WOS记录号	WOS:000263893800040
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/2427636
专题	半导体研究所
通讯作者	Zhang, X. W.
作者单位	Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
推荐引用方式 GB/T 7714	You, J. B.,Zhang, X. W.,Fan, Y. M.,et al. Effects of crystalline quality on the ultraviolet emission and electrical properties of the zno films deposited by magnetron sputtering[J]. Applied surface science,2009,255(11):5876-5880.
APA	You, J. B.,Zhang, X. W.,Fan, Y. M.,Yin, Z. G.,Cai, F.,&Chen, N. F..(2009).Effects of crystalline quality on the ultraviolet emission and electrical properties of the zno films deposited by magnetron sputtering.Applied surface science,255(11),5876-5880.
MLA	You, J. B.,et al."Effects of crystalline quality on the ultraviolet emission and electrical properties of the zno films deposited by magnetron sputtering".Applied surface science 255.11(2009):5876-5880.

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