Enhancement of electroluminescence in p-i-n structures with nano-crystalline si/sio(2) multilayers | |
Chen, D. Y.1,2; Wei, D. Y.1,2; Xu, J.1,2; Han, P. G.1,2; Wang, X.1,2; Ma, Z. Y.1,2; Chen, K. J.1,2; Shi, W. H.3; Wang, Q. M.3 | |
刊名 | Semiconductor science and technology |
2008 | |
卷号 | 23期号:1页码:4 |
ISSN号 | 0268-1242 |
DOI | 10.1088/0268-1242/23/1/015013 |
通讯作者 | Xu, j.(junxu@nju.edu.cn) |
英文摘要 | Nano-crystalline si/sio(2) multilayers were prepared by alternately changing the ultra-thin amorphous si film deposition and the in situ plasma oxidation process followed by the post-annealing treatments. well-defined periodic structures can be achieved with 2.5 nm thick sio(2) sublayers. it is shown that the size of formed nano-crystalline si is about 3 nm. room temperature electroluminescence can be observed and the spectrum contains two luminescence bands located at 650 nm and 520 nm. in order to improve the hole injection probability, p-i-n structures containing a nanocrystalline si/sio(2) luminescent layer were designed and fabricated on different p-type substrates. it is found that the turn-on voltage of p-i-n structures is obviously reduced and the luminescence intensity increases by 50 times. it is demonstrated that the use of a heavy-doped p-type substrate can increase the luminescence intensity more efficiently compared with the light-doped p-type substrate due to the enhanced hole injection. |
WOS关键词 | SILICON NANOCRYSTALS ; POROUS SILICON ; MOS STRUCTURES ; LUMINESCENCE ; PHOTOLUMINESCENCE ; SUPERLATTICE ; FILMS |
WOS研究方向 | Engineering ; Materials Science ; Physics |
WOS类目 | Engineering, Electrical & Electronic ; Materials Science, Multidisciplinary ; Physics, Condensed Matter |
语种 | 英语 |
出版者 | IOP PUBLISHING LTD |
WOS记录号 | WOS:000253279700013 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/2427213 |
专题 | 半导体研究所 |
通讯作者 | Xu, J. |
作者单位 | 1.Nanjing Univ, Natl Lab Solid State Microstruct, Nanjing 210093, Peoples R China 2.Nanjing Univ, Dept Phys, Nanjing 210093, Peoples R China 3.Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, Beijing 100083, Peoples R China |
推荐引用方式 GB/T 7714 | Chen, D. Y.,Wei, D. Y.,Xu, J.,et al. Enhancement of electroluminescence in p-i-n structures with nano-crystalline si/sio(2) multilayers[J]. Semiconductor science and technology,2008,23(1):4. |
APA | Chen, D. Y..,Wei, D. Y..,Xu, J..,Han, P. G..,Wang, X..,...&Wang, Q. M..(2008).Enhancement of electroluminescence in p-i-n structures with nano-crystalline si/sio(2) multilayers.Semiconductor science and technology,23(1),4. |
MLA | Chen, D. Y.,et al."Enhancement of electroluminescence in p-i-n structures with nano-crystalline si/sio(2) multilayers".Semiconductor science and technology 23.1(2008):4. |
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