CORC  > 半导体研究所
Growth of high quality semi-insulating inp single crystal by suppression of compensation defects
Zhao, YW; Dong, ZY; Duan, ML; Sun, WR; Yang, ZX
刊名Journal of rare earths
2006-03-01
卷号24页码:75-77
关键词Indium phosphide Defect Semi-insualting
ISSN号1002-0721
通讯作者Zhao, yw(zhaoyw@red.semi.ac.cn)
英文摘要Deep level defects in as-grown and annealed si-inp samples were investigated by thermally stimulated current spectroscopy. correlations between electrical property, compensation ratio, thermal stability and deep defect concentration in si-inp were revealed. an optimized crystal growth condition for high quality si-inp was demonstrated based on the experimental results.
WOS关键词STIMULATED CURRENT SPECTROSCOPY ; CURRENT TRANSIENT SPECTROSCOPY ; SEMI-INSULATING INP ; DEEP-LEVEL DEFECTS ; FE
WOS研究方向Chemistry
WOS类目Chemistry, Applied
语种英语
出版者METALLURGICAL INDUSTRY PRESS
WOS记录号WOS:000237331400022
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/2426827
专题半导体研究所
通讯作者Zhao, YW
作者单位Chinese Acad Sci, Inst Semicond, Beijing 100083, Peoples R China
推荐引用方式
GB/T 7714
Zhao, YW,Dong, ZY,Duan, ML,et al. Growth of high quality semi-insulating inp single crystal by suppression of compensation defects[J]. Journal of rare earths,2006,24:75-77.
APA Zhao, YW,Dong, ZY,Duan, ML,Sun, WR,&Yang, ZX.(2006).Growth of high quality semi-insulating inp single crystal by suppression of compensation defects.Journal of rare earths,24,75-77.
MLA Zhao, YW,et al."Growth of high quality semi-insulating inp single crystal by suppression of compensation defects".Journal of rare earths 24(2006):75-77.
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