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Molecular beam epitaxy inas dot arrays on ingaas/gaas
Jiao, Y. H.; Wu, J.; Xu, B.; Jin, P.; Hu, L. J.; Liang, L. Y.; Ren, Y. Y.; Wang, Z. G.
刊名Nanotechnology
2006-12-14
卷号17期号:23页码:5846-5850
ISSN号0957-4484
DOI10.1088/0957-4484/17/23/022
通讯作者Jiao, y. h.()
英文摘要Periodical alignment of the inas dots along the < 100 > and < 110 > directions was observed on an elastically relaxed ingaas buffer layer grown at 500 and 450 degrees c, respectively, on the vicinal gaas(001) substrate. due to alignment along these directions, the inas dots were arranged into a quasi-two-dimensional hexagonal lattice. such a periodical arrangement of inas dots may be explained in terms of modulation in strain as well as composition along [110] as observed by using cross-sectional transmission electron microscopy.
WOS关键词CHEMICAL-VAPOR-DEPOSITION ; FIELD-EFFECT TRANSISTORS ; QUANTUM-DOTS ; SELF-ORGANIZATION ; ISLANDS ; NANOSTRUCTURES ; SUPERLATTICES ; GROWTH ; SURFACE ; GAAS(100)
WOS研究方向Science & Technology - Other Topics ; Materials Science ; Physics
WOS类目Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied
语种英语
出版者IOP PUBLISHING LTD
WOS记录号WOS:000242598200022
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/2426756
专题半导体研究所
通讯作者Jiao, Y. H.
作者单位Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
推荐引用方式
GB/T 7714
Jiao, Y. H.,Wu, J.,Xu, B.,et al. Molecular beam epitaxy inas dot arrays on ingaas/gaas[J]. Nanotechnology,2006,17(23):5846-5850.
APA Jiao, Y. H..,Wu, J..,Xu, B..,Jin, P..,Hu, L. J..,...&Wang, Z. G..(2006).Molecular beam epitaxy inas dot arrays on ingaas/gaas.Nanotechnology,17(23),5846-5850.
MLA Jiao, Y. H.,et al."Molecular beam epitaxy inas dot arrays on ingaas/gaas".Nanotechnology 17.23(2006):5846-5850.
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