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	Preparation and characterization of hydrogenated carbon nitride films synthesized by dual dc-rf plasma system
	Hao, JY; Xu, T; Liu, WM
刊名	Materials science and engineering a-structural materials properties microstructure and processing
	2005-11-05
卷号	408期号:1-2页码:297-302
关键词	Carbon nitride films Pecvd Composition Mechanical properties
ISSN号	0921-5093
DOI	10.1016/j.msea.2005.08.146
通讯作者	Liu, wm()
英文摘要	Carbon nitride films (cnx films) were deposited on si(100) substrates making use of dual direct current radio frequency (dc-rf) plasma enhanced chemical vapor deposition (pecvd), using a mixed gas of ch4 and n-2 as the source gas. the microstructures, morphologies, and compositions of the resulting cnx films were analyzed by means of atomic force microscopy (afm), transmission electron microscopy (tem), xray photoelectron spectroscopy (xps), fourier transformation infrared spectrometry (ftir), and raman spectroscopy. the mechanical properties of the cnx films were examined using a nano-indentation test system. the raman spectrum showed two characteristic bands: a graphite g band and a disordered d band of carbon, which suggested the presence of an amorphous carbon matrix. ftir and xps measurements suggested the existence of c-nh, c=nh, c&3bond; n, n-h, and c-h in the cnx films, and the nitrogen to carbon atom ratio (n/c) is as much as 0.50. moreover, the tem showed various diffraction rings of different d values, which could confirm the polycrystallites embedded in the cnx matrix. besides, the quality and elasticity of the cnx films were significantly improved by the incorporation of nitrogen. the films prepared in the present work had much higher hardness and young's modulus than the dlc films prepared under the same conditions, and the elastic recovery parameter was up to 89%. (c) 2005 elsevier b.v. all rights reserved.
WOS关键词	CHEMICAL-VAPOR-DEPOSITION ; DIAMOND-LIKE CARBON ; AMORPHOUS-CARBON ; THIN-FILMS ; MECHANICAL-PROPERTIES ; INFRARED-ABSORPTION ; ION ; RESONANCE ; RAMAN ; XPS
WOS研究方向	Science & Technology - Other Topics ; Materials Science ; Metallurgy & Metallurgical Engineering
WOS类目	Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering
语种	英语
出版者	ELSEVIER SCIENCE SA
WOS记录号	WOS:000233524700042
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/2377850
专题	中国科学院大学
通讯作者	Liu, WM
作者单位	1.Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Peoples R China 2.Grad Univ, Chinese Acad Sci, Beijing 100039, Peoples R China
推荐引用方式 GB/T 7714	Hao, JY,Xu, T,Liu, WM. Preparation and characterization of hydrogenated carbon nitride films synthesized by dual dc-rf plasma system[J]. Materials science and engineering a-structural materials properties microstructure and processing,2005,408(1-2):297-302.
APA	Hao, JY,Xu, T,&Liu, WM.(2005).Preparation and characterization of hydrogenated carbon nitride films synthesized by dual dc-rf plasma system.Materials science and engineering a-structural materials properties microstructure and processing,408(1-2),297-302.
MLA	Hao, JY,et al."Preparation and characterization of hydrogenated carbon nitride films synthesized by dual dc-rf plasma system".Materials science and engineering a-structural materials properties microstructure and processing 408.1-2(2005):297-302.

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