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	Solvent assisted capillary force lithography
	Yu, XH; Wang, Z; Xing, RB; Luan, SF; Han, YC
刊名	Polymer
	2005-11-21
卷号	46期号:24页码:11099-11103
关键词	Capillary force lithography Photolithography Polystyrene
ISSN号	0032-3861
DOI	10.1016/j.polymer.2005.09.015
通讯作者	Han, yc()
英文摘要	Capillary force lithography (cfl) utilizes the capillary-filling phenomenon of a polymeric melt into a cavity to pattern the polymer film coated on a substrate. most cfl approaches are realized at high temperatures. the solvent-assisted cfl method proposed here realizes patterning at ambient temperature. a swollen pdms (poly(dimethysilane)) stamp by solvent is placed in contact with a polymer thin film. as the solvent reserved in the pdms stamp diffuses into the polymer film, the polymer can be dissolved or swollen. then the capillary force drives the pattern formation. by carefully choosing the experimental conditions, it is possible to produce highly regular and reproducible nano- to micrometer scale polymer patterns using the same microscopic patterned mold. complex polymer patterns can also be fabricated through the multiple printing. (c) 2005 elsevier ltd. all rights reserved.
WOS关键词	SOFT LITHOGRAPHY ; MICROSTRUCTURES ; FABRICATION ; POLYMERS ; SURFACES ; STAMPS ; DIODES ; FILMS
WOS研究方向	Polymer Science
WOS类目	Polymer Science
语种	英语
出版者	ELSEVIER SCI LTD
WOS记录号	WOS:000233144700056
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/2377742
专题	中国科学院大学
通讯作者	Han, YC
作者单位	Chinese Acad Sci, Changchun Inst Appl Chem, Grad Sch, State Key Lab Polymer Phys & Chem, Changchun 130022, Peoples R China
推荐引用方式 GB/T 7714	Yu, XH,Wang, Z,Xing, RB,et al. Solvent assisted capillary force lithography[J]. Polymer,2005,46(24):11099-11103.
APA	Yu, XH,Wang, Z,Xing, RB,Luan, SF,&Han, YC.(2005).Solvent assisted capillary force lithography.Polymer,46(24),11099-11103.
MLA	Yu, XH,et al."Solvent assisted capillary force lithography".Polymer 46.24(2005):11099-11103.

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