Morphologies Control of Inkjet-printed Silver Lines by Substrate Temperature | |
Wang CY(王驰远); Cheng XD(程晓鼎); Zhu YL(朱云龙); Zhang L(张磊) | |
2017 | |
会议日期 | July 31 - August 4, 2017 |
会议地点 | Hawaii, USA |
关键词 | Morphology Control Substrate Temperature Inkjet Printing Line, Roughness |
页码 | 679-683 |
英文摘要 | The effects of surface properties of the substrate on the geometrical characteristics of inkjet-printed silver lines are investigated. Silver nanoparticle ink is printed on the paper and silicon wafers, which are frequently used as substrates of electronic devices. The microscopic three-dimensional structure is constituted by repeatedly printing of lines when the substrate temperature varies from 60°C to 100°C. The roughness of the substrate has no significant effects on the line morphologies while the substrate temperature is the major factor. Cross-section views of printed lines change from convex to concave shapes as the substrate temperature increases on both substrates. When the substrate temperature rises to 90°C, the coffee ring effect begins to appear on the paper substrate but does not happen on silicon wafers. Further studies show that a small ratio of edge length to area or high surface roughness is helpful to reduce the occurrence of the coffee ring effect. Suitable morphologies of printed lines to improve the performance of electronic devices can be obtained by controlling surface properties of the substrate. |
源文献作者 | IEEE Robotics and Automation Society |
产权排序 | 1 |
会议录 | 2017 IEEE 7th Annual International Conference on CYBER Technology in Automation, Control, and Intelligent Systems, CYBER 2017 |
会议录出版者 | IEEE |
会议录出版地 | New York |
语种 | 英语 |
ISBN号 | 978-1-5386-0489-2 |
WOS记录号 | WOS:000447628700124 |
内容类型 | 会议论文 |
源URL | [http://ir.sia.cn/handle/173321/22832] |
专题 | 沈阳自动化研究所_数字工厂研究室 |
通讯作者 | Cheng XD(程晓鼎) |
作者单位 | Shenyang Institute of Automation, University of Chinese Academy of Sciences, Shenyang, China |
推荐引用方式 GB/T 7714 | Wang CY,Cheng XD,Zhu YL,et al. Morphologies Control of Inkjet-printed Silver Lines by Substrate Temperature[C]. 见:. Hawaii, USA. July 31 - August 4, 2017. |
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