Structural and electrical properties of CuIn1-xAlxSe2 thin films prepared by radio-frequency magnetron sputtering process | |
Zhang, Jun[1]; Deng, Hongmei[2]; He, Jun[3]; Meng, Xiankuan[4]; Liu, Tantan[5]; Sun, Lin[6]; Yang, Pingxiong[7]; Chu, Junhao[8] | |
刊名 | APPLIED SURFACE SCIENCE |
2015 | |
卷号 | 326页码:211-215 |
关键词 | CuIn1-xAlxSe2 Sputtering Thin film Interface |
ISSN号 | 0169-4332 |
URL标识 | 查看原文 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/2236830 |
专题 | 上海大学 |
作者单位 | 1.[1]E China Normal Univ, Dept Elect Engn, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R China. 2.[2]Shanghai Univ, Lab Microstruct, Shanghai 200444, Peoples R China. 3.[3]E China Normal Univ, Dept Elect Engn, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R China. 4.[4]E China Normal Univ, Dept Elect Engn, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R China. 5.[5]E China Normal Univ, Dept Elect Engn, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R China. 6.[6]E China Normal Univ, Dept Elect Engn, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R China. 7.[7]E China Normal Univ, Dept Elect Engn, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R China. 8.[8]E China Normal Univ, Dept Elect Engn, Minist Educ, Key Lab Polar Mat & Devices, Shanghai 200241, Peoples R China. |
推荐引用方式 GB/T 7714 | Zhang, Jun[1],Deng, Hongmei[2],He, Jun[3],et al. Structural and electrical properties of CuIn1-xAlxSe2 thin films prepared by radio-frequency magnetron sputtering process[J]. APPLIED SURFACE SCIENCE,2015,326:211-215. |
APA | Zhang, Jun[1].,Deng, Hongmei[2].,He, Jun[3].,Meng, Xiankuan[4].,Liu, Tantan[5].,...&Chu, Junhao[8].(2015).Structural and electrical properties of CuIn1-xAlxSe2 thin films prepared by radio-frequency magnetron sputtering process.APPLIED SURFACE SCIENCE,326,211-215. |
MLA | Zhang, Jun[1],et al."Structural and electrical properties of CuIn1-xAlxSe2 thin films prepared by radio-frequency magnetron sputtering process".APPLIED SURFACE SCIENCE 326(2015):211-215. |
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