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	Effect of Sputtering Pressure on the Properties of Boron and Gallium Co-doped ZnO Thin Films
	Chen, Mengfei[1]; Huang, Jian[2]; Yang, Jin[3]; Tang, Ke[4]; Lu, Yuanxi[5]; Wang, Linjun[6]
	2016
会议名称	International Symposium on Materials Application and Engineering (SMAE)
会议日期	2016-08-20
URL标识	查看原文
内容类型	会议论文
URI标识	http://www.corc.org.cn/handle/1471x/2230232
专题	上海大学
作者单位	1.[1]Shanghai Univ, Sch Mat Sci & Engn, 333 Nanchen Rd, Shanghai 200444, Peoples R China. 2.[2]Shanghai Univ, Sch Mat Sci & Engn, 333 Nanchen Rd, Shanghai 200444, Peoples R China. 3.[3]Shanghai Univ, Sch Mat Sci & Engn, 333 Nanchen Rd, Shanghai 200444, Peoples R China. 4.[4]Shanghai Univ, Sch Mat Sci & Engn, 333 Nanchen Rd, Shanghai 200444, Peoples R China. 5.[5]Shanghai Univ, Sch Mat Sci & Engn, 333 Nanchen Rd, Shanghai 200444, Peoples R China. 6.[6]Shanghai Univ, Sch Mat Sci & Engn, 333 Nanchen Rd, Shanghai 200444, Peoples R China.
推荐引用方式 GB/T 7714	Chen, Mengfei[1],Huang, Jian[2],Yang, Jin[3],et al. Effect of Sputtering Pressure on the Properties of Boron and Gallium Co-doped ZnO Thin Films[C]. 见:International Symposium on Materials Application and Engineering (SMAE). 2016-08-20.

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