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Utilization of Resist Stencil Lithography for Multidimensional Fabrication on a Curved Surface
Li, Mingling; Lin, Yue; Wu, Yukun; Ren, Wenzhen; Cai, Hongbing; Zhang, Guanghui; Meng, Qiushi; Ding, Huaiyi; Yu, Xinxin; Zhang, Kun
刊名ACS NANO
2018
卷号Vol.12 No.9页码:9626-9632
关键词resist stencil lithography curved surface multidimensional fabrication wavy nanostructures curved gratings
ISSN号1936-0851
URL标识查看原文
内容类型期刊论文
URI标识http://www.corc.org.cn/handle/1471x/2202268
专题安徽大学
作者单位1.Anhui Univ, Phys Sch, Hefei 230601, Anhui, Peoples R China
2.Univ Sci & Technol China, Hefei Natl Lab Phys Sci Microscale, Hefei 230026, Anhui, Peoples R China
3.Univ Sci & Technol China, Natl Synchrotron Radiat Lab, Hefei 230027, Anhui, Peoples R China
4.Univ Sci & Technol China, Dept Phys, Hefei 230027, Anhui, Peoples R China
5.Univ Sci & Technol China, Synerget Innovat Ctr Quantum Informat & Quantum P, Hefei 230026, Anhui, Peoples R China
6.Univ Sci & Technol China, USTC Ctr Micro & Nanoscale Res & Fabricat, Hefei 230026, Anhui, Peoples R China
推荐引用方式
GB/T 7714
Li, Mingling,Lin, Yue,Wu, Yukun,et al. Utilization of Resist Stencil Lithography for Multidimensional Fabrication on a Curved Surface[J]. ACS NANO,2018,Vol.12 No.9:9626-9632.
APA Li, Mingling.,Lin, Yue.,Wu, Yukun.,Ren, Wenzhen.,Cai, Hongbing.,...&Zhang, Kun.(2018).Utilization of Resist Stencil Lithography for Multidimensional Fabrication on a Curved Surface.ACS NANO,Vol.12 No.9,9626-9632.
MLA Li, Mingling,et al."Utilization of Resist Stencil Lithography for Multidimensional Fabrication on a Curved Surface".ACS NANO Vol.12 No.9(2018):9626-9632.
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