Utilization of Resist Stencil Lithography for Multidimensional Fabrication on a Curved Surface | |
Li, Mingling; Lin, Yue; Wu, Yukun; Ren, Wenzhen; Cai, Hongbing; Zhang, Guanghui; Meng, Qiushi; Ding, Huaiyi; Yu, Xinxin; Zhang, Kun | |
刊名 | ACS NANO |
2018 | |
卷号 | Vol.12 No.9页码:9626-9632 |
关键词 | resist stencil lithography curved surface multidimensional fabrication wavy nanostructures curved gratings |
ISSN号 | 1936-0851 |
URL标识 | 查看原文 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/2202268 |
专题 | 安徽大学 |
作者单位 | 1.Anhui Univ, Phys Sch, Hefei 230601, Anhui, Peoples R China 2.Univ Sci & Technol China, Hefei Natl Lab Phys Sci Microscale, Hefei 230026, Anhui, Peoples R China 3.Univ Sci & Technol China, Natl Synchrotron Radiat Lab, Hefei 230027, Anhui, Peoples R China 4.Univ Sci & Technol China, Dept Phys, Hefei 230027, Anhui, Peoples R China 5.Univ Sci & Technol China, Synerget Innovat Ctr Quantum Informat & Quantum P, Hefei 230026, Anhui, Peoples R China 6.Univ Sci & Technol China, USTC Ctr Micro & Nanoscale Res & Fabricat, Hefei 230026, Anhui, Peoples R China |
推荐引用方式 GB/T 7714 | Li, Mingling,Lin, Yue,Wu, Yukun,et al. Utilization of Resist Stencil Lithography for Multidimensional Fabrication on a Curved Surface[J]. ACS NANO,2018,Vol.12 No.9:9626-9632. |
APA | Li, Mingling.,Lin, Yue.,Wu, Yukun.,Ren, Wenzhen.,Cai, Hongbing.,...&Zhang, Kun.(2018).Utilization of Resist Stencil Lithography for Multidimensional Fabrication on a Curved Surface.ACS NANO,Vol.12 No.9,9626-9632. |
MLA | Li, Mingling,et al."Utilization of Resist Stencil Lithography for Multidimensional Fabrication on a Curved Surface".ACS NANO Vol.12 No.9(2018):9626-9632. |
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