离子源偏压对PIA-EB-Hf法制备的HfO_2激光薄膜性能的影响 | |
Fu Chao-Li[1]; Yang Yong[2]; Ma Yun-Feng[3]; Wei Yu-Quan[4]; Jiao Zheng[5]; Huang Zheng-Ren[6] | |
刊名 | 无机材料学报 |
2017 | |
卷号 | 32页码:69-74 |
关键词 | HfO2薄膜 等离子体辅助电子束蒸发 离子源偏压 微观结构 激光损伤 |
ISSN号 | 1000-324X |
URL标识 | 查看原文 |
内容类型 | 期刊论文 |
URI标识 | http://www.corc.org.cn/handle/1471x/2193018 |
专题 | 上海大学 |
作者单位 | 1.[1]Chinese Acad Sci, Shanghai Inst Ceram, Struct Ceram Engn Res Ctr, Shanghai 201800, Peoples R China. 2.Shanghai Univ, Coll Environm Chem & Engn, Shanghai 200444, Peoples R China. 3.[2]Chinese Acad Sci, Shanghai Inst Ceram, Struct Ceram Engn Res Ctr, Shanghai 201800, Peoples R China. 4.[3]Chinese Acad Sci, Shanghai Inst Ceram, Struct Ceram Engn Res Ctr, Shanghai 201800, Peoples R China. 5.[4]Chinese Acad Sci, Shanghai Inst Ceram, Struct Ceram Engn Res Ctr, Shanghai 201800, Peoples R China. 6.[5]Shanghai Univ, Coll Environm Chem & Engn, Shanghai 200444, Peoples R China. 7.[6]Chinese Acad Sci, Shanghai Inst Ceram, Struct Ceram Engn Res Ctr, Shanghai 201800, Peoples R China. |
推荐引用方式 GB/T 7714 | Fu Chao-Li[1],Yang Yong[2],Ma Yun-Feng[3],等. 离子源偏压对PIA-EB-Hf法制备的HfO_2激光薄膜性能的影响[J]. 无机材料学报,2017,32:69-74. |
APA | Fu Chao-Li[1],Yang Yong[2],Ma Yun-Feng[3],Wei Yu-Quan[4],Jiao Zheng[5],&Huang Zheng-Ren[6].(2017).离子源偏压对PIA-EB-Hf法制备的HfO_2激光薄膜性能的影响.无机材料学报,32,69-74. |
MLA | Fu Chao-Li[1],et al."离子源偏压对PIA-EB-Hf法制备的HfO_2激光薄膜性能的影响".无机材料学报 32(2017):69-74. |
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