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	Synthesis of Zn-doped colloidal SiO2 abrasives and their applications in sapphire chemical mechanical polishing slurry
	Lei, Hong[1]; Huang, LiQin[2]; Gu, Qian[3]
刊名	JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
	2017
卷号	28页码:1229-1237
ISSN号	0957-4522
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/2192894
专题	上海大学
作者单位	1.[1]Shanghai Univ, Res Ctr Nanosci & Nanotechnol, Shanghai 200444, Peoples R China. 2.Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200444, Peoples R China. 3.[2]Shanghai Univ, Res Ctr Nanosci & Nanotechnol, Shanghai 200444, Peoples R China. 4.Shanghai Univ, Sch Mat Sci & Engn, Shanghai 200444, Peoples R China. 5.[3]Shanghai Univ, Res Ctr Nanosci & Nanotechnol, Shanghai 200444, Peoples R China.
推荐引用方式 GB/T 7714	Lei, Hong[1],Huang, LiQin[2],Gu, Qian[3]. Synthesis of Zn-doped colloidal SiO2 abrasives and their applications in sapphire chemical mechanical polishing slurry[J]. JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS,2017,28:1229-1237.
APA	Lei, Hong[1],Huang, LiQin[2],&Gu, Qian[3].(2017).Synthesis of Zn-doped colloidal SiO2 abrasives and their applications in sapphire chemical mechanical polishing slurry.JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS,28,1229-1237.
MLA	Lei, Hong[1],et al."Synthesis of Zn-doped colloidal SiO2 abrasives and their applications in sapphire chemical mechanical polishing slurry".JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS 28(2017):1229-1237.

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