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	The effect of Cu ion implantation and post-annealing on surface morphology and electron field emission in ultrananocrystalline diamond (EI收录)
	Shen, Yanyan[1]; Zhang, Yixin[1]; Zhang, Chao[3]; Hei, Hongjun[1]; Qi, Ting[1]; Yu, Sheng Wang[1]; He, Zhiyong[1]; Jia, Yuxin[1]; Ma, Genwang[1]; Dong, Lijuan[2]
刊名	Journal of Alloys and Compounds
	2017
卷号	709页码:8-15
关键词	Conductive films Copper Diamond films Diamonds Electron emission Electron transport properties Electrons Field emission Heavy ions Ion implantation Ions Photoelectron spectroscopy Single crystals Surface morphology
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/2182931
专题	华南理工大学
作者单位	1.[1] Research Institute of Surface Engineering, Taiyuan University of Technology, Taiyuan, China 2.[2] Shanxi Provincial Key Laboratory of Electromagnetic Functional Materials for Microstructure, Shanxi Datong University, China 3.[3] Material & Industrial Technology Research Institute, Beijing, China
推荐引用方式 GB/T 7714	Shen, Yanyan[1],Zhang, Yixin[1],Zhang, Chao[3],等. The effect of Cu ion implantation and post-annealing on surface morphology and electron field emission in ultrananocrystalline diamond (EI收录)[J]. Journal of Alloys and Compounds,2017,709:8-15.
APA	Shen, Yanyan[1].,Zhang, Yixin[1].,Zhang, Chao[3].,Hei, Hongjun[1].,Qi, Ting[1].,...&Dong, Lijuan[2].(2017).The effect of Cu ion implantation and post-annealing on surface morphology and electron field emission in ultrananocrystalline diamond (EI收录).Journal of Alloys and Compounds,709,8-15.
MLA	Shen, Yanyan[1],et al."The effect of Cu ion implantation and post-annealing on surface morphology and electron field emission in ultrananocrystalline diamond (EI收录)".Journal of Alloys and Compounds 709(2017):8-15.

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