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	Atomic layer deposition of buffer layers for the growth of vertically aligned carbon nanotube arrays
	Haohao Li[1]; Guangjie Yuan[2]; Bo Shan[3]; Xiaoxin Zhang[4]; Hongping Ma[5]; Yingzhong Tian[6]; Hongliang Lu[7]; Johan Liu[8]
刊名	Nanoscale Research Letters
	2019
卷号	14页码:119
关键词	Atomic layer deposition Oxide buffer layers Thermal interface materials Vertically aligned carbon nanotube arrays
ISSN号	1931-7573
URL标识	查看原文
内容类型	期刊论文
URI标识	http://www.corc.org.cn/handle/1471x/2161166
专题	上海大学
作者单位	[1]Shanghai University[2]Shanghai University[3]Shanghai University[4]Shanghai University[5]Fudan University[6]Shanghai University[7]Fudan University[8]Shanghai University
推荐引用方式 GB/T 7714	Haohao Li[1],Guangjie Yuan[2],Bo Shan[3],et al. Atomic layer deposition of buffer layers for the growth of vertically aligned carbon nanotube arrays[J]. Nanoscale Research Letters,2019,14:119.
APA	Haohao Li[1].,Guangjie Yuan[2].,Bo Shan[3].,Xiaoxin Zhang[4].,Hongping Ma[5].,...&Johan Liu[8].(2019).Atomic layer deposition of buffer layers for the growth of vertically aligned carbon nanotube arrays.Nanoscale Research Letters,14,119.
MLA	Haohao Li[1],et al."Atomic layer deposition of buffer layers for the growth of vertically aligned carbon nanotube arrays".Nanoscale Research Letters 14(2019):119.

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