Highly Reproducible Nanolithography by Dynamic Plough of an Atomic-Force Microscope Tip and Thermal-Annealing Treatment

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	Highly Reproducible Nanolithography by Dynamic Plough of an Atomic-Force Microscope Tip and Thermal-Annealing Treatment
	Lu XF ; Balocco C ; Yang FH ; Song AM
刊名	ieee transactions on nanotechnology
	2011
卷号	10 期号:1 页码:53-58
关键词	Atomic-force microscope (AFM) nanolithography self-switching diodes (SSDs) 2-D electron gas CONDUCTING POLYMER-FILMS NANOMETER-SCALE LITHOGRAPHY FABRICATION SURFACES DEVICES NANOSTRUCTURES
ISSN号	1536-125x
通讯作者	lu, xf, univ manchester, sch elect & elect engn, manchester m13 9pl, lancs, englandxiaofeng.lu@manchester.ac.uk ; claudio.balocco@manchester.ac.uk ; fhyang@red.semi.ac.cn ; a.song@manchester.ac.uk
学科主题	半导体物理
收录类别	SCI
资助信息	u.k. technology strategy board ; royal society
语种	英语
公开日期	2011-07-05 ; 2011-07-15
附注	an approach has been developed to use atomic-force microscope (afm) to pattern materials at the nanoscale in a controlled manner. by introducing a thermal-annealing process above the glass-transition temperature of poly (methylmethacrylate) (pmma), the profile of indented nanopatterns has been dramatically improved by abatement of the tip-induced debris. this eliminates the main problem of the previous afm-based tip-ploughing lithography method, namely the debris formation during the nanoplough and trench refilling by debris. we are able to reproducibly fabricate nanopatterns down to 40 nm. meanwhile, the afm-tip lifetime has been increased substantially. in particular, the adhesion between the pmma layer on the edge of trenches and the substrate is significantly improved to enable reliable pattern transfer into gaas/algaas heterostructures by wet-chemical etching. functional nanodevices with a lateral feature size of 100 nm to an etching depth of 70 nm are demonstrated using the method.
内容类型	期刊论文
源URL	[http://ir.semi.ac.cn/handle/172111/20901]
专题	半导体研究所_半导体超晶格国家重点实验室
推荐引用方式 GB/T 7714	Lu XF,Balocco C,Yang FH,et al. Highly Reproducible Nanolithography by Dynamic Plough of an Atomic-Force Microscope Tip and Thermal-Annealing Treatment[J]. ieee transactions on nanotechnology,2011,10(1):53-58.
APA	Lu XF,Balocco C,Yang FH,&Song AM.(2011).Highly Reproducible Nanolithography by Dynamic Plough of an Atomic-Force Microscope Tip and Thermal-Annealing Treatment.ieee transactions on nanotechnology,10(1),53-58.
MLA	Lu XF,et al."Highly Reproducible Nanolithography by Dynamic Plough of an Atomic-Force Microscope Tip and Thermal-Annealing Treatment".ieee transactions on nanotechnology 10.1(2011):53-58.