Analysis of surface roughness in Ti/Al/Ni/Au Ohmic contact to AlGaN/GaN high electron mobility transistors
Zhang BS (张宝顺); Cai Y (蔡勇)
刊名Applied Physics Letters
2010-08-09
期号6
关键词aggregation aluminium aluminium compounds gallium compounds gold high electron mobility transistors III-V semiconductors nickel ohmic contacts rapid thermal annealing semiconductor-metal boundaries surface morphology surface roughness titanium transmission electron microscopy wide band gap semiconductors X-ray chemical analysis
通讯作者Gong, RM
合作状况其它
英文摘要A mechanism of the formation of the bulges on the surface of Ti/Al/Ni/Au Ohmic contact in AlGaN/GaN high electron mobility transistors is proposed. According to the analysis of TEM images and corresponding electron dispersive x-ray spectra, the bulges were found to consist of Ni-Al alloy in the body and Au-Al alloy surrounding. We deduce that the bulges were formed due to Ni-Al alloy aggregation in some local areas during the rapid thermal annealing process, which accounts for the rough surface morphology.
收录类别SCI ; EI
语种英语
WOS记录号WOS:000280940900045
公开日期2010-12-31
内容类型期刊论文
源URL[http://58.210.77.100/handle/332007/313]  
专题苏州纳米技术与纳米仿生研究所_纳米加工公共平台
推荐引用方式
GB/T 7714
Zhang BS ,Cai Y . Analysis of surface roughness in Ti/Al/Ni/Au Ohmic contact to AlGaN/GaN high electron mobility transistors[J]. Applied Physics Letters,2010(6).
APA Zhang BS ,&Cai Y .(2010).Analysis of surface roughness in Ti/Al/Ni/Au Ohmic contact to AlGaN/GaN high electron mobility transistors.Applied Physics Letters(6).
MLA Zhang BS ,et al."Analysis of surface roughness in Ti/Al/Ni/Au Ohmic contact to AlGaN/GaN high electron mobility transistors".Applied Physics Letters .6(2010).
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