Structural and optical properties of nearly stress-free m-plane ZnO film on (100) gamma-LiAlO2 with a GaN buffer layer by metal-organic chemical vapor deposition | |
Xu K (徐科)![]() | |
刊名 | Applied Surface Science
![]() |
2009-08-30 | |
卷号 | 255期号:22页码:9146-9148 |
关键词 | m-Plane ZnO thin film Semiconductor compounds Chemical vapor deposition Residual stress Photoluminescence spectra |
通讯作者 | Zhou, SM |
合作状况 | 其它 |
英文摘要 | (1 0 (1) over bar 0) m-plane ZnO film was epitaxially deposited on (1 0 0) gamma-LiAlO2 by metal-organic chemical vapor deposition at 600 degrees C with a GaN buffer layer. The epitaxial relationships between ZnO and GaN, GaN and (1 0 0) gamma-LiAlO2 were determined by X-ray diffraction Phi-scans. There exhibits very small decrease for the E-2 mode shift (0.3 cm (1)) of ZnO in the Raman spectrum, which indicates the epitaxial ZnO film was under a slight tensile stress (5.77 x 10(7) Pa). Unlike the highly strained a-plane ZnO, temperature dependent photoluminescence spectra show that the free A exiton emission was observed with the temperature <= 138 K. |
收录类别 | SCI ; EI |
语种 | 英语 |
WOS记录号 | WOS:000269075700031 |
公开日期 | 2011-03-14 |
内容类型 | 期刊论文 |
源URL | [http://58.210.77.100/handle/332007/381] ![]() |
专题 | 苏州纳米技术与纳米仿生研究所_测试分析平台 |
推荐引用方式 GB/T 7714 | Xu K . Structural and optical properties of nearly stress-free m-plane ZnO film on (100) gamma-LiAlO2 with a GaN buffer layer by metal-organic chemical vapor deposition[J]. Applied Surface Science,2009,255(22):9146-9148. |
APA | Xu K .(2009).Structural and optical properties of nearly stress-free m-plane ZnO film on (100) gamma-LiAlO2 with a GaN buffer layer by metal-organic chemical vapor deposition.Applied Surface Science,255(22),9146-9148. |
MLA | Xu K ."Structural and optical properties of nearly stress-free m-plane ZnO film on (100) gamma-LiAlO2 with a GaN buffer layer by metal-organic chemical vapor deposition".Applied Surface Science 255.22(2009):9146-9148. |
个性服务 |
查看访问统计 |
相关权益政策 |
暂无数据 |
收藏/分享 |
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。
修改评论