A simple strategy to tailor the microstructure and wear-resistance of sputtered WS2 films | |
Gao XM(高晓明); Xu SS(徐书生); Hu M(胡明); Sun JY(孙嘉奕); Weng LJ(翁立军); Liu WM(刘维民); Gao XM(高晓明) | |
刊名 | Materials Letters |
2018 | |
卷号 | 216期号:0页码:179-181 |
关键词 | Physical Vapour Deposition Thin Films Structural |
ISSN号 | 0167-577X |
DOI | 10.1016/j.matlet.2018.01.027 |
英文摘要 | Sputtered WS2 films can be modified by adding some amount of hetero-elements to overcome the porous columnar microstructure and thereby to enhance the wear resistance. However, the recession of tribological properties of WS2-hetero-element composite films in low earth orbit environment would be a potential danger because most hetero-elements succumbed to oxidation by atomic oxygen. Herein, by altering deposition argon pressure to adjust the plasmas bombard function on growing WS2 film, the characteristic porous microstructure disappeared. At the optimization condition, the sputtered WS2 film exhibited a dense microstructure, high ratio of S to W, and thereby much better wear-resistance. However, the excessive bombardment would result in the prominent loss of S atoms in WS2 film and the deterioration of tribological properties. |
学科主题 | 材料科学与物理化学 |
资助项目 | PVD润滑薄膜研究组 ; 空间润滑材料研究组 |
语种 | 英语 |
WOS记录号 | WOS:000424713000048 |
资助机构 | China National Natural Science Foundation (Grant Nos. 51575508 ; 51505465) |
内容类型 | 期刊论文 |
源URL | [http://ir.licp.ac.cn/handle/362003/22854] |
专题 | 兰州化学物理研究所_先进润滑与防护材料研究发展中心 兰州化学物理研究所_固体润滑国家重点实验室 |
通讯作者 | Gao XM(高晓明) |
作者单位 | State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences, Lanzhou 730000, PR China |
推荐引用方式 GB/T 7714 | Gao XM,Xu SS,Hu M,et al. A simple strategy to tailor the microstructure and wear-resistance of sputtered WS2 films[J]. Materials Letters,2018,216(0):179-181. |
APA | Gao XM.,Xu SS.,Hu M.,Sun JY.,Weng LJ.,...&Gao XM.(2018).A simple strategy to tailor the microstructure and wear-resistance of sputtered WS2 films.Materials Letters,216(0),179-181. |
MLA | Gao XM,et al."A simple strategy to tailor the microstructure and wear-resistance of sputtered WS2 films".Materials Letters 216.0(2018):179-181. |
个性服务 |
查看访问统计 |
相关权益政策 |
暂无数据 |
收藏/分享 |
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。
修改评论