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题名	大视场成像椭偏仪及其应用研究
作者	谷利元
文献子类	博士
导师	曾爱军
关键词	成像椭偏仪，大视场，测量技术，超薄金属薄膜，厚度参数，表面等离子体共振 Imaging Ellipsometer，Large field of view，Measuring technology，Ultra-thin metal film，Thickness parameter，Surface Plasmon Resonance
其他题名	Imaging ellipsometer with large field of view and its application
英文摘要	成像椭偏仪是一种结合了椭偏测量技术与显微成像技术的测量仪器，它能够以高的空间分辨率完成对大尺寸样品的一次性参数测量。得益于这种优异的性能，成像椭偏仪已经广泛地应用在了多个领域，比如：生物蛋白相互反应的实时监测，不均匀薄膜样品的三维形貌测量，二维材料的参数测量，自组装单层的实时监测。可以预见，成像椭偏仪将在未来的科研及生产活动中发挥更大的作用。针对目前商用市场上成像椭偏仪存在视场小、成像性能不够优异等现状，本论文将致力于研制一台高性能、大视场的成像椭偏仪以及开展基于该仪器的应用研究，具体的工作包括： 1. 概述了椭偏技术发展历程及国内外研究现状，对成像椭偏仪的种类和椭偏数据处理方法做了一个归纳，详细介绍了椭偏测量技术的基础理论，包括：光波偏振态的描述方法，起偏器、补偿器和相位调制器的基本理论，椭偏参数测量方法，椭偏数据反演的基本流程。 2. 完成了大视场成像椭偏仪的总体方案设计，介绍了仪器的光学、机械、电路、软件等各个子功能模块的研制工作，重点研究了椭偏数据处理算法,并编写了大视场成像椭偏仪的控制软件和数据处理软件。在仪器的装调过程中，提出了一些针对仪器关键部件偏振参数的测量技术，基于这些技术完成了仪器的装调工作。利用多个半导体薄膜样品对装调好的仪器进行了标定，标定后的仪器测量精度达到了与商用椭偏仪相当的测量精度。 3. 研制的大视场成像椭偏仪具有视场大、成像性能优异的特点，基于该特点开展了两种薄膜参数测量应用研究。研究了一种大尺寸均匀薄膜光学参数与表面缺陷测量技术，该技术可以快速地测量出均匀薄膜的表面缺陷，并且可以精确地测得薄膜的光学常数。提出了一种大尺寸石墨烯边界快速测量技术，利用该技术可以快速、精确的测量出基底上石墨烯层的边界位置。 4. 研制的大视场成像椭偏仪可以与表面等离子体装置进行联调，基于此，开展了结合大视场成像椭偏仪的两种超薄金属薄膜测量技术研究。研究了一种基于平凸透镜Otto结构的SPR椭偏测量技术，该技术可以实现对厚度< 10 nm的超薄金属薄膜的厚度、折射率、消光系数等参数的测量。提出了一种基于柱面透镜Otto结构的SPR测量技术，在该技术中，通过对P光入射下采集的单幅图像进行处理就可以得到金属薄膜在一维方向上的厚度分布。; The imaging ellipsometer is a measuring instrument combining ellipsometry and microscopic imaging technology. It can perform one-time parametric measurement of large-size samples with high spatial resolution.Due to the benefits of the excellent performance, imaging ellipsometry has been widely used in many fields, such as real-time monitoring of the interaction of biological proteins，the three-dimensional morphology measurement of inhomogeneous thin film samples, the parameter measurement of two-dimensional materials, and the real-time monitoring of self-assembled monolayers.It is foreseeable that the imaging ellipsometer will play a greater role in future research and production activities. In view of the fact that there is no imaging ellipsometer with large field of view (cm-size and above) and excellent imaging performance in the current commercial market, this dissertation will focus on the development of a high-performance, large-field-of-view imaging ellipsometer and the application of this instrument. The main work includes： 1. The development process of ellipsometry technology and the research status, both domestic and abroad, are summarized. The basic theory of the ellipsometry technique is studied, including the description method of the polarization state of the light wave, the basic theory of the polarizer, the compensator and the phase modulator, the measurement method of the ellipsometric parameter, and the process of inversion of the ellipsometric data. 2. The overall scheme of the large-field-of-view imaging ellipsometer and the functional modules of the instrument consisting of optical, mechanical, circuit and software were introduced in detail. The ellipsometric data processing algorithm was studied emphatically, and the control software and data processing software for large-field imaging ellipsometry was developed. During the adjusting and optimizing process of the instrument, some measuring techniques for the polarization parameters of the instrument’s key components were proposed. Based on these technologies, the instrument's optimization work was completed. Several semiconductor thin film samples were used to test and calibrate the well-tuned instrument and the calibrated instrument achieves the comparable measurement accuracy with respect to the commercial ellipsometry. 3. The imaging ellipsometer developed has the characteristics of large field of view and excellent imaging performance. Based on the characteristic, two methods for measuring thin film parameters are proposed. One is a technique for measuring the optical parameters and surface defects of a large-sized uniform thin film. This technique can quickly measure the surface defects of a uniform thin film and accurately measure the optical constant of the thin film. The other is the rapid measurement technique for large-scale graphene boundaries. With this technique, the boundary of the graphene layer on the substrate can be quickly and accurately measured. 4. The developed ellipsometry can be combined with the surface plasmon device. Based on this, two kinds of ultra-thin metal film measurement technology are proposed. The first is SPR ellipsometry technique based on Otto structure of plano-convex lens. This technology can realize accurate measurement of the thickness, refractive index and extinction coefficient of an ultra-thin metal film with a thickness <10 nm. The second is SPR measurement technique based on cylindrical lens Otto structure. In this technique, the thickness distribution of a metal film in a one-dimensional direction can be obtained by processing a single image captured under incident P light.
学科主题	光学工程
内容类型	学位论文
源URL	[http://ir.siom.ac.cn/handle/181231/31108]
专题	中国科学院上海光学精密机械研究所
作者单位	中国科学院上海光学精密机械研究所
推荐引用方式 GB/T 7714	谷利元. 大视场成像椭偏仪及其应用研究[D].

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