Proximity correction and resolution enhancement of plasmonic lens lithography far beyond the near field diffraction limit

CORC > 光电技术研究所 > 中国科学院光电技术研究所 > 微细加工光学技术国家重点实验室（开放室）

	Proximity correction and resolution enhancement of plasmonic lens lithography far beyond the near field diffraction limit
	Luo, Yunfei 1; Liu, Ling 1,2; Zhang, Wei 1; Kong, Weijie 1; Zhao, Chengwei 1; Gao, Ping 1; Zhao, Zeyu 1; Pu, Mingbo 1; Wang, Changtao 1; Luo, Xiangang 1
刊名	RSC Advances
	2017
卷号	7 期号:20 页码:12366-12373
关键词	Plasmons - Scanning probe microscopy
ISSN号	2046-2069
英文摘要	Near-field optical imaging methods have been suffering from the issue of a near field diffraction limit, i.e. imaging resolution and fidelity depend strongly on the distance away from objects, which occurs due to the great decay effect of evanescent waves. Recently, plasmonic cavity lens with off-axis light illumination was proposed as a method for going beyond the near field diffraction limit for imaging dense nanoline patterns. In this paper, this investigation was further extended to more general cases for isolated and discrete line patterns, by enhancing the resolution and correcting the proximity effect with assistant peripheral groove structures. Experiment results demonstrate that the width of single, double and multiple line patterns is well controlled and the uniformity is significantly improved in lithography with a 365 nm light wavelength and 120 nm working distance, being approximately ten times the air distance defined by the near field diffraction limit. The methods are believed to find applications in nanolithography, high density optical storage, scanning probe microscopy and so forth. © The Royal Society of Chemistry.
语种	英语
内容类型	期刊论文
源URL	[http://ir.ioe.ac.cn/handle/181551/8884]
专题	光电技术研究所_微细加工光学技术国家重点实验室（开放室）
作者单位	1.State Key Laboratory of Optical Technologies on Nano-Fabrication and Micro-Engineering, Institute of Optics and Electronics, Chinese Academy of Sciences, P.O. Box 350, Chengdu; 610209, China; 2.University of Chinese Academy of Sciences, Beijing; 100049, China
推荐引用方式 GB/T 7714	Luo, Yunfei,Liu, Ling,Zhang, Wei,et al. Proximity correction and resolution enhancement of plasmonic lens lithography far beyond the near field diffraction limit[J]. RSC Advances,2017,7(20):12366-12373.
APA	Luo, Yunfei.,Liu, Ling.,Zhang, Wei.,Kong, Weijie.,Zhao, Chengwei.,...&Luo, Xiangang.(2017).Proximity correction and resolution enhancement of plasmonic lens lithography far beyond the near field diffraction limit.RSC Advances,7(20),12366-12373.
MLA	Luo, Yunfei,et al."Proximity correction and resolution enhancement of plasmonic lens lithography far beyond the near field diffraction limit".RSC Advances 7.20(2017):12366-12373.