High-speed near-field photolithography at 16.85 nm linewidth with linearly polarized illumination

	High-speed near-field photolithography at 16.85 nm linewidth with linearly polarized illumination
	Ji, Jiaxin 1,2; Meng, Yonggang 2; Hu, Yueqiang 2; Xu, Jian 3; Li, Shayu 3; Yang, Guoqiang 3
刊名	OPTICS EXPRESS
	2017-07-24
卷号	25 期号:15 页码:17571-17580
英文摘要	Plasmonic focusing was investigated in concentric rings with a central pillar under linearly polarized illumination with a specific incident angle. When changing the incident angle of linearly polarized beam between 6 and 15 degree away from the normal direction, the focal spot size can keep a steady value of 37 nm, smaller than the focal spot with the radially polarized beam at the same excited condition, 45 nm. Combining this with the highspeed near-field photolithography technology, we demonstrated a plasmonic lithography with 16.85 nm linewidth on both organic and inorganic photo-resists in large scale at scanning speeds up to 11.3 m/s. This inclined linearly polarized illumination is easy to realize in a prototype of near-field photolithography system, and it opens a new cost effective approach towards the next generation lithography for nano-manufacturing. (C) 2017 Optical Society of America
语种	英语
内容类型	期刊论文
源URL	[http://ir.iccas.ac.cn/handle/121111/39318]
专题	化学研究所_光化学实验室
作者单位	1.China Univ Petr, Coll Mech & Elect Engn, Qingdao 257061, Peoples R China 2.Tsinghua Univ, State Key Lab Tribol, Beijing 100084, Peoples R China 3.Chinese Acad Sci, Inst Chem, CAS Key Lab Photochem, Beijing Natl Lab Mol Sci, Beijing 100190, Peoples R China
推荐引用方式 GB/T 7714	Ji, Jiaxin,Meng, Yonggang,Hu, Yueqiang,et al. High-speed near-field photolithography at 16.85 nm linewidth with linearly polarized illumination[J]. OPTICS EXPRESS,2017,25(15):17571-17580.
APA	Ji, Jiaxin,Meng, Yonggang,Hu, Yueqiang,Xu, Jian,Li, Shayu,&Yang, Guoqiang.(2017).High-speed near-field photolithography at 16.85 nm linewidth with linearly polarized illumination.OPTICS EXPRESS,25(15),17571-17580.
MLA	Ji, Jiaxin,et al."High-speed near-field photolithography at 16.85 nm linewidth with linearly polarized illumination".OPTICS EXPRESS 25.15(2017):17571-17580.