Measurement of Wavefront Aberration of Extreme Ultraviolet Lithographic Projection Lens Based on Ptychography

CORC > 上海光学精密机械研究所 > 中国科学院上海光学精密机械研究所 > 信息光学与光电技术实验室

	Measurement of Wavefront Aberration of Extreme Ultraviolet Lithographic Projection Lens Based on Ptychography
	Meng ZJ(孟泽江); Fang W(方伟); Tang F(唐锋); Wang XC(王向朝); Zhu PH(朱鹏辉); Li J(李杰); Zhang H(张恒)
刊名	光学学报
	2016
卷号	36 期号:10 页码:1012002
通讯作者	fangwei20050200@163.com ; tangfeng@siom.ac.cn
中文摘要	Ptychography是一种基于扫描式相干衍射成像的相位恢复技术,实验装置简单,抗干扰能力强。将 Ptychography技术用于投影物镜波像差的检测,并分析了检测不同数值孔径投影物镜波像差所采用的光场传播公式、离散化条件及实验架构。数值仿真与实验结果表明,Ptychography技术用于波像差检测时检测标记的通光率需要在45%~80%范围内;增加标记图案的复杂性并在计算过程中增加配准环节可提高收敛速度与检测精度;波像差检测精度在10~(-3)lambda以内。将Ptychography技术应用于极紫外
英文摘要	Ptychography, a phase retrieval technology based on scanning coherent diffractive imaging, shows such advantages as simple experimental setup and strong anti-noise ability. Ptychography is used in the field of wavefront metrology for projection lens. The formulas of optical field propagation, the conditions of discretion, and the experimental configurations are analyzed in detail for projection lenses with different numerical apertures. Numerical simulations and experimental results show that to achieve reasonable convergence and measurement accuracy, the transmittance of the object should be set between 45% and 80%. Increasing the complexity of the object pattern and adding registration process of probe and object into the iterative algorithm can also improve the convergence speed and the recovery accuracy. The wavefront aberration measurement accuracy can reach 10~(-3)lambda or less. It is feasible to use ptychography in wavefront aberration measurement for extreme ultraviolet lithographic projection lenses.
收录类别	CSCD
资助信息	国家自然科学基金重点项目; 中国科学院青年创新促进会项目
CSCD记录号	CSCD:5829295
WOS记录号	CSCD:5829295
内容类型	期刊论文
源URL	[http://ir.siom.ac.cn/handle/181231/27514]
专题	上海光学精密机械研究所_信息光学与光电技术实验室
作者单位	中国科学院上海光学精密机械研究所
推荐引用方式 GB/T 7714	Meng ZJ,Fang W,Tang F,et al. Measurement of Wavefront Aberration of Extreme Ultraviolet Lithographic Projection Lens Based on Ptychography[J]. 光学学报,2016,36(10):1012002.
APA	孟泽江.,方伟.,唐锋.,王向朝.,朱鹏辉.,...&张恒.(2016).Measurement of Wavefront Aberration of Extreme Ultraviolet Lithographic Projection Lens Based on Ptychography.光学学报,36(10),1012002.
MLA	孟泽江,et al."Measurement of Wavefront Aberration of Extreme Ultraviolet Lithographic Projection Lens Based on Ptychography".光学学报 36.10(2016):1012002.