The growth of nickel-manganese and cobalt-manganese layered double hydroxides on reduced graphene oxide for supercapacitor

	The growth of nickel-manganese and cobalt-manganese layered double hydroxides on reduced graphene oxide for supercapacitor
	Li, M; Cheng, JP; Wang, J; Liu, F; Zhang, XB
刊名	ELECTROCHIMICA ACTA
	2016-07-10
卷号	206 页码:108-115
关键词	Layered double hydroxide Reduced graphene oxide Electrochemical performance Supercapacitors
ISSN号	0013-4686
通讯作者	Cheng, JP (reprint author), Zhejiang Univ, Sch Mat Sci & Engn, State Key Lab Silicon Mat, Key Lab Adv Mat & Applicat Batteries Zhejiang Pro, Hangzhou 310027, Zhejiang, Peoples R China.
学科主题	Electrochemistry
语种	英语
WOS记录号	WOS:000376535100013
内容类型	期刊论文
源URL	[http://ir.lzu.edu.cn/handle/262010/181639]
专题	物理科学与技术学院_期刊论文
推荐引用方式 GB/T 7714	Li, M,Cheng, JP,Wang, J,et al. The growth of nickel-manganese and cobalt-manganese layered double hydroxides on reduced graphene oxide for supercapacitor[J]. ELECTROCHIMICA ACTA,2016,206:108-115.
APA	Li, M,Cheng, JP,Wang, J,Liu, F,&Zhang, XB.(2016).The growth of nickel-manganese and cobalt-manganese layered double hydroxides on reduced graphene oxide for supercapacitor.ELECTROCHIMICA ACTA,206,108-115.
MLA	Li, M,et al."The growth of nickel-manganese and cobalt-manganese layered double hydroxides on reduced graphene oxide for supercapacitor".ELECTROCHIMICA ACTA 206(2016):108-115.