Effects of negative bias and flux ratio on the properties of TiN thin films formed by filtered cathodic arc plasma technique

	Effects of negative bias and flux ratio on the properties of TiN thin films formed by filtered cathodic arc plasma technique
	Zhang, Y.J.; Yan, P.X.; Wu, Z.G.; Zhang, W.W.; Wang, J.; Xue, Q.J.
刊名	Acta Metallurgica Sinica (English Letters)
	2005-06
卷号	18 期号:3 页码:369-374
关键词	Argon/nitrogen flux ratio Filtered cathodic arc plasma (FCAP) Filtered cathodic vacuum arc (FCVA) technique Negative bias Preferred orientation TiN
ISSN号	10067191
通讯作者	Zhang, Y.J.
学科主题	Plasma Physics;Physical Properties of Gases, Liquids and Solids;Coating Techniques;Inorganic Compounds;Chemical Operations;Nonferrous Metals and Alloys excluding Alkali and Alkaline Earth Metals
语种	英语
内容类型	期刊论文
源URL	[http://ir.lzu.edu.cn/handle/262010/178061]
专题	物理科学与技术学院_期刊论文
推荐引用方式 GB/T 7714	Zhang, Y.J.,Yan, P.X.,Wu, Z.G.,et al. Effects of negative bias and flux ratio on the properties of TiN thin films formed by filtered cathodic arc plasma technique[J]. Acta Metallurgica Sinica (English Letters),2005,18(3):369-374.
APA	Zhang, Y.J.,Yan, P.X.,Wu, Z.G.,Zhang, W.W.,Wang, J.,&Xue, Q.J..(2005).Effects of negative bias and flux ratio on the properties of TiN thin films formed by filtered cathodic arc plasma technique.Acta Metallurgica Sinica (English Letters),18(3),369-374.
MLA	Zhang, Y.J.,et al."Effects of negative bias and flux ratio on the properties of TiN thin films formed by filtered cathodic arc plasma technique".Acta Metallurgica Sinica (English Letters) 18.3(2005):369-374.