Genetic analysis of tolerance to photo-oxidative stress induced by high light in winter wheat (Triticum aestivum L.)

doi:10.1016/S1673-8527(09)60058-8

	Genetic analysis of tolerance to photo-oxidative stress induced by high light in winter wheat (Triticum aestivum L.)
	Li, Hongwei 1; Tong, Yiping 1; Li, Bin 1; Jing, Ruilian 2; Lu, Congming 3; Li, Zhensheng 1
刊名	JOURNAL OF GENETICS AND GENOMICS
	2010
卷号	37 期号:6 页码:399-412
关键词	Triticum aestivum photooxidation high light chlorophyll content chlorophyll fluorescence grain filling QTL
ISSN号	1673-8527
DOI	10.1016/S1673-8527(09)60058-8
通讯作者	Li, Hongwei
英文摘要	High light induced photooxidation (HLIP) usually leads to leaf premature senescence and causes great yield loss in winter wheat. In order to explore the genetic control of wheat tolerance to HLIP stress, a quantitative trait loci (QTL) analysis was conducted on a set of doubled haploid population, derived from two winter wheat cultivars. Actual values of chlorophyll content (Chl), minimum fluorescence level (Fo), maximum fluorescence level (Fm), and the maximum quantum efficiency of photosystem II (Fv/Fm) under both HLIP and non-stress conditions as well as the ratios of HLIP to non-stress were evaluated. HLIP considerably reduced Chl, Fm, and Fv/Fm, but increased Fo, compared with that under non-stress condition. A total of 27, 16, and 28 QTLs were associated with the investigated traits under HLIP and non-stress and the ratios of HLIP to non-stress, respectively. Most of the QTLs for the ratios of HLIP to non-stress collocated or nearly linked with those detected under HLIP condition. HLIP-induced QTLs were mapped on 15 chromosomes, involving in 1A, 1B, 1D, 2A, 2B, 2D, 3A, 3B, 4A, 4D, 5B, 6A, 6B, 7A, and 7D while those expressed under non-stress condition involved in nine chromosomes, including 1B, 1D, 2A, 2B, 3B, 4A, 5A, 5B, and 7A. The expression patterns of QTLs under HLIP condition were different from that under non-stress condition except for six loci on five chromosomes. The phenotypic variance explained by individual QTL ranged from 5.0% to 19.7% under HLIP, 8.3% to 20.8% under non-stress, and 4.9% to 20.2% for the ratios of HLIP to non-stress, respectively. Some markers, for example, Xgwm192 and WMC331 on 4D regulating Chl, Fo, Fm, and Fv/Fm under HLIP condition, might be used in marker assistant selection.
学科主题	Biochemistry & Molecular Biology ; Genetics & Heredity ; BIOCHEMISTRY & MOLECULAR BIOLOGY ; GENETICS & HEREDITY
语种	英语
出版者	SCIENCE PRESS
WOS记录号	WOS:000279428000006
内容类型	期刊论文
源URL	[http://111.203.20.206/handle/2HMLN22E/5415]
专题	作物科学研究所_分子生物学系
作者单位	1.Chinese Acad Sci, State Key Lab Plant Cell & Chromosome Engn, Inst Genet & Dev Biol, Beijing 100101, Peoples R China 2.Chinese Acad Agr Sci, Inst Crop Sci, Beijing 100081, Peoples R China 3.Chinese Acad Sci, Key Lab Photosynth & Environm Mol Physiol, Photosynth Res Ctr, Inst Bot, Beijing 100093, Peoples R China
推荐引用方式 GB/T 7714	Li, Hongwei,Tong, Yiping,Li, Bin,et al. Genetic analysis of tolerance to photo-oxidative stress induced by high light in winter wheat (Triticum aestivum L.)[J]. JOURNAL OF GENETICS AND GENOMICS,2010,37(6):399-412.
APA	Li, Hongwei,Tong, Yiping,Li, Bin,Jing, Ruilian,Lu, Congming,&Li, Zhensheng.(2010).Genetic analysis of tolerance to photo-oxidative stress induced by high light in winter wheat (Triticum aestivum L.).JOURNAL OF GENETICS AND GENOMICS,37(6),399-412.
MLA	Li, Hongwei,et al."Genetic analysis of tolerance to photo-oxidative stress induced by high light in winter wheat (Triticum aestivum L.)".JOURNAL OF GENETICS AND GENOMICS 37.6(2010):399-412.