Research on deformation and aberration of active plate used in lithographic objective

CORC > 长春光学精密机械与物理研究所 > 中国科学院长春光学精密机械与物理研究所 > 中科院长春光机所知识产出

	Research on deformation and aberration of active plate used in lithographic objective
	Yao, C. and Y. Gong
刊名	Guangxue Xuebao/Acta Optica Sinica
	2016
卷号	36 期号:4
英文摘要	Monochromator is the necessary equipment for spectral imager to calibrate the spectrum continuously. In order to calibrate the hyperspectral imaging spectrometer continuously, a small-type and high-spectral-resolution grating monochromator is designed. The grating monochromator with horizontal Czerny-Turner structure is designed with high-spectral-resolution as a starting point, and the design idea is discussed in detail from choosing the grating, calculating the focal length, the sizes of entrance slit and exit slit, among others. Using this method, the necessary structure parameters are determined, and the impact of the necessary structure parameters for spectral resolution and volume is given. According to the optical characteristics of the grating monochromator, the mechanical structures of the instrument are designed for small and handy from the components of the entrance slit, the collimator lens and imaging objective lens, the scanning structures, the fuselage and so on. The relationship of the sine mechanism parameters for output wavelength and wavelength scanning accuracy is given. The design and adjustment of the instrument are completed. The visible spectrums of mercury lamp are used as calibration lines, and the calibration curve is acquired by using least square method. This paper gives a method that combining the limit error of the step number and the calibration curve to evaluate the wavelength repeatability and wavelength precision. The datum of experiment shows that the spectral resolution of the instrument is better than 0. 1 nm in the wavelength band from 400 to 800 can. Simultaneously the wavelength repeatability reach to +/- 0. 096 6 nm and the precision reach to +/- 0. 096 9 nm.
收录类别	EI
语种	中文
内容类型	期刊论文
源URL	[http://ir.ciomp.ac.cn/handle/181722/57362]
专题	长春光学精密机械与物理研究所_中科院长春光机所知识产出
推荐引用方式 GB/T 7714	Yao, C. and Y. Gong. Research on deformation and aberration of active plate used in lithographic objective[J]. Guangxue Xuebao/Acta Optica Sinica,2016,36(4).
APA	Yao, C. and Y. Gong.(2016).Research on deformation and aberration of active plate used in lithographic objective.Guangxue Xuebao/Acta Optica Sinica,36(4).
MLA	Yao, C. and Y. Gong."Research on deformation and aberration of active plate used in lithographic objective".Guangxue Xuebao/Acta Optica Sinica 36.4(2016).